Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | HPGD | P15428 | 1/20 | 0.34 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.32 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.31 |
| ▸ | POLB | P06746 | 1/20 | 0.31 |
| ▸ | HTT | P42858 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13232344 | 0.99 | ALDH1A1 (0.33) | ALDH1A1KDM4EHPGDHSD17B10MAPK1 | |
| SCHEMBL13232363 | 0.81 | ALDH1A1 (0.34) | ALDH1A1KDM4EHPGDHSD17B10MAPK1 | |
| SCHEMBL13232345 | 0.81 | KDM4E (0.32) | ALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL15279128 | 0.79 | — | — | |
| SCHEMBL13232347 | 0.79 | — | — | |
| SCHEMBL9927432 | 0.76 | FKBP1A (0.40) | ALDH1A1KDM4EHPGDHSD17B10 | |
| SCHEMBL76460 | 0.74 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL4824444 | 0.74 | CYP3A4 (0.33) | ALDH1A1HSD17B10MAPK1 | |
| SCHEMBL4856836 | 0.74 | CYP3A4 (0.33) | ALDH1A1HSD17B10MAPK1 | |
| SCHEMBL10417245 | 0.74 | CYP3A4 (0.33) | ALDH1A1HSD17B10MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9760004-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9760004-B2 | Radiation-sensitive resin composition and resist pattern-forming method | JSR CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-20150253663-A1 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20150253663-A1 | COMPOSITION FOR PATTERN FORMATION, AND PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| US-20150093703-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-04-02 | — | — | US | disclosed |
| US-20150093703-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST PATTERN-FORMING METHOD | JSR CORPORATION (JP) | 2015-04-02 | — | — | US | disclosed |
| US-8541606-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8541606-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8541606-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2013-09-24 | — | — | US | disclosed |
| US-20120149921-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-20120149921-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2012-06-14 | — | — | US | disclosed |
| US-8105746-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-8105746-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-8105746-B2 | Tertiary alcohol derivative, polymer compound and photoresist composition | KURARAY CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20100167200-A1 | (Meth)acrylate compound, photosensitive polymer, and resist composition including the same | CHEIL INDUSTRIES, INC. (KR) | 2010-07-01 | — | — | US | disclosed |
| US-20100167200-A1 | (Meth)acrylate compound, photosensitive polymer, and resist composition including the same | CHEIL INDUSTRIES, INC. (KR) | 2010-07-01 | — | — | US | disclosed |
| US-20090029290-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| US-20090029290-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| US-20090029290-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | KURARAY CO., LTD. (JP) | 2009-01-29 | — | — | US | disclosed |
| EP-1992651-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | Kuraray Co., Ltd. (JP) | 2008-11-19 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090029290-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | ADH1A, ADH1C, ADH5 | ALDH1A1 247/4885KDM4E 2260/4885HPGD 373/4885 |
| US-20100167200-A1 | (Meth)acrylate compound, photosensitive polymer, and resist composition including the same | MMAB, TET1, MGMT | ALDH1A1 372/4885KDM4E 711/4885HPGD 3160/4885 |
| US-20120149921-A1 | TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION | ADH1A, ADH1C, ADH5 | ALDH1A1 66/4885KDM4E 2986/4885HPGD 466/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.