Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL4975696

CC(C)(C)Oc1ccccc1-c1ccccc1I.O=S(=O)(O)C(F)(F)F

nearest known ligand 0.35

Full drug profile on Sugi Atlas →

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
SLC22A12 Q96S37 1/20 0.34
RORC P51449 11/20 0.33
FABP4 P15090 1/20 0.33
FABP5 Q01469 1/20 0.33
HSD11B1 P28845 1/20 0.31
HSD17B3 P37058 1/20 0.31
CYP2C9 P11712 1/20 0.31
CYP2C19 P33261 1/20 0.31
BRD4 O60885 1/20 0.31
SCN9A Q15858 1/20 0.31
IDO1 P14902 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL5851785 0.85 SLC22A12 (0.46) ALDH1A1SLC22A12
Trifluoromethanesulfonic Acid SCHEMBL216502 0.81 PPARG (0.39) ALDH1A1HSD11B1CYP2C9CYP2C19SCN9A
Trifluoromethanesulfonic Acid SCHEMBL1140970 0.81 PPARG (0.39) ALDH1A1HSD11B1CYP2C9CYP2C19SCN9A
Trifluoromethanesulfonic Acid SCHEMBL8736536 0.79 PTGDR2 (0.49) ALDH1A1CYP2C9CYP2C19IDO1
Trifluoromethanesulfonic Acid SCHEMBL8736614 0.78 ALDH1A1 (0.39) ALDH1A1L3MBTL1SLC22A12HSD11B1
Trifluoromethanesulfonic Acid SCHEMBL8736420 0.77 PTGDR2 (0.45) CYP2C9CYP2C19IDO1
Trifluoromethanesulfonic Acid SCHEMBL8737223 0.75 POLB (0.40) ALDH1A1L3MBTL1CYP2C9CYP2C19
SCHEMBL12355661 0.74 CA12 (0.39) ALDH1A1L3MBTL1HSD11B1
Trifluoromethanesulfonic Acid SCHEMBL8735167 0.74 TRPA1 (0.39) ALDH1A1RORCHSD11B1CYP2C9CYP2C19
Trifluoromethanesulfonic Acid SCHEMBL4660340 0.73 PTPN1 (0.42) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7332616-B2 Polymerizable compound, polymer, positive-resist composition, and patterning process using the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-02-19 US disclosed
US-20070185226-A1 NOVEL POLYMERIZABLE COMPOUND, POLYMER, POSITIVE-RESIST COMPOSITION, AND PATTERNING PROCESS USING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-08-09 US disclosed