SCHEMBL4977858

SCHEMBL4977858

CCC(COC(=O)CC(C)S)OC(=O)CC(C)S

nearest known ligand 0.54

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
PRKCA P17252 5/20 0.51
ALDH1A1 P00352 1/20 0.41
LMNA P02545 1/20 0.41
PRKCE Q02156 1/20 0.38
PRKCQ Q04759 1/20 0.38
PRKCD Q05655 1/20 0.38
LPAR1 Q92633 2/20 0.34
LPAR3 Q9UBY5 2/20 0.34
ENPP2 Q13822 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL97727 0.91 PRKCA (0.56) PRKCAALDH1A1LMNAPRKCEPRKCQ
SCHEMBL2860440 0.86 PRKCA (0.70) PRKCAPRKCEPRKCQPRKCD
SCHEMBL16857556 0.80 PRKCA (0.49) PRKCAALDH1A1LMNAPRKCEPRKCQ
SCHEMBL98666 0.79 PRKCA (0.43) PRKCAALDH1A1LMNA
SCHEMBL30673065 0.79 PRKCA (0.43) PRKCAALDH1A1LMNA
SCHEMBL6002424 0.79 ALDH1A1 (0.50) PRKCAALDH1A1LMNAPRKCEPRKCQ
SCHEMBL2859972 0.75 PRKCA (0.40) PRKCA
SCHEMBL14415219 0.75 PRKCA (0.59) PRKCAALDH1A1LMNAPRKCEPRKCQ
SCHEMBL18431389 0.75 MMP1 (0.35) PRKCALMNA
SCHEMBL15198874 0.75 ALDH1A1 (0.47) PRKCAALDH1A1LMNAPRKCEPRKCQ

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1478668-B1 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION SHOWA DENKO KK (JP) 2013-04-10 EP disclosed
US-7341828-B2 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2008-03-11 US disclosed
US-20060079593-A1 Hexaarylbiimidazole compounds and photopolymerization initiator compositions containing the same SHOWA DENKO K.K. (JP) 2006-04-13 US disclosed
US-20060036023-A1 Color filter black matrix resist composition SHOWA DENKO K.K. (JP) 2006-02-16 US disclosed
EP-1573397-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION Showa Denko K.K. (JP) 2005-09-14 EP disclosed
US-20050153231-A1 Thiol compound, photopolymerization initiator composition and photosensitive composition SHOWA DENKO K.K. (JP) 2005-07-14 US disclosed
EP-1478668-A2 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION Showa Denko K.K. (JP) 2004-11-24 EP disclosed
WO-2004055596-A1 COLOR FILTER BLACK MATRIX RESIST COMPOSITION SHOWA DENKO K. K. (JP) 2004-07-01 WO disclosed
WO-2003072614-A2 THIOL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPOSITION AND PHOTOSENSITIVE COMPOSITION SHOWA DENKO K.K. (JP) 2003-09-04 WO disclosed