SCHEMBL4980283

SCHEMBL4980283

CCCC(C)(C)Oc1ccc(OC(C)(C)CCC)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 1/20 0.39
NQO1 P15559 1/20 0.36
PPARA Q07869 5/20 0.35
TSHR P16473 3/20 0.35
CYP1A2 P05177 2/20 0.35
CYP3A4 P08684 2/20 0.35
ABCB11 O95342 1/20 0.35
HTR2A P28223 1/20 0.35
PMP22 Q01453 1/20 0.35
PPARG P37231 1/20 0.34
ALDH1A1 P00352 1/20 0.33
MEN1 O00255 2/20 0.32
KMT2A Q03164 2/20 0.32
MAPT P10636 2/20 0.32
KDM4E B2RXH2 1/20 0.32
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
ESR1 P03372 2/20 0.32
ESR2 Q92731 2/20 0.32
NPC1 O15118 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6358939 0.89 KDM4E (0.40) ELANEPPARACYP1A2ALDH1A1MEN1
SCHEMBL19262085 0.89 CYP1A2 (0.37) ELANEPPARATSHRCYP1A2PPARG
SCHEMBL1452863 0.89 LTA4H (0.39) PPARATSHRPPARGLTA4H
SCHEMBL18435485 0.88 THRB (0.42) PPARAPPARGALDH1A1KMT2AMAPT
SCHEMBL5729302 0.86 ST14 (0.42) PPARAPPARG
SCHEMBL14706808 0.86 NPC1 (0.51) ALDH1A1MAPTNPC1RAB9A
SCHEMBL22349664 0.84 CYP2A6 (0.42) PPARATSHRALDH1A1MAPTKDM4E
SCHEMBL13349096 0.84 GABRP (0.35) ELANENQO1
SCHEMBL5351296 0.84 CHRNB2 (0.42) ELANEPPARATSHRALDH1A1MEN1
SCHEMBL23475049 0.83 NQO1 (0.34) ELANENQO1ALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114080442-B Quantum dot, curable composition, cured layer, color filter and display device 三星SDI株式会社 2024-07-16 CN disclosed
CN-114096640-B Quantum dot, curable composition including the same, cured layer, and color filter 三星SDI株式会社 2024-07-16 CN disclosed
CN-118103462-A Curable composition, cured layer using the same, color filter including the cured layer, and display device including the color filter 三星SDI株式会社 2024-05-28 CN disclosed
CN-118019826-A Curable composition, cured layer using the same, color filter including the cured layer, and display device including the color filter 三星SDI株式会社 2024-05-10 CN disclosed
CN-115612311-B Dye, composition comprising same, film, optical member and display device 三星SDI株式会社 2024-03-22 CN disclosed
CN-112724959-B Quantum dot, curable composition, cured layer, and color filter including the same 三星SDI株式会社 2024-03-22 CN disclosed
CN-117716293-A Photosensitive composition, color filter substrate, fingerprint sensor and display device 东丽株式会社 2024-03-15 CN disclosed
CN-114127226-B Quantum dot, curable composition including the same, cured layer, and color filter 三星SDI株式会社 2024-03-12 CN disclosed
CN-111454711-B Quantum dot, composition, cured layer using the same, color filter and display device including the cured layer, and method of manufacturing the cured layer 三星SDI株式会社 2024-03-12 CN disclosed
CN-111149058-B Transparent photosensitive resin composition and application thereof, photoetching spacer, liquid crystal display device and manufacturing method thereof 东丽株式会社 2024-03-08 CN disclosed
CN-110809807-A Method for manufacturing conductive film, method for manufacturing field effect transistor using same, and method for manufacturing wireless communication device 东丽株式会社 2020-02-18 CN disclosed
CN-110669177-A Curable composition comprising quantum dot, resin layer using the same, and display device 三星SDI株式会社 2020-01-10 CN disclosed
US-20190243242-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAYER USING THE SAME, AND COLOR FILTER SAMSUNG SDI CO., LTD. (KR) 2019-08-08 US disclosed
CN-106462058-A Photosensitive resin composition, method for manufacturing conductive pattern, substrate, element, and touch screen 东丽株式会社 2017-02-22 CN disclosed
EP-1651689-A4 HEAVY-HYDROGENATED NORBORNYL (METH)ACRYLATES, PROCESS FOR PRODUCING THEM, POLYMERS THEREOF AND OPTICAL MEMBERS FUJIFILM CORP (JP) 2008-11-19 EP disclosed
EP-1651688-A4 HEAVY-HYDROGENATED (METH)ACRYLATES, PROCESS FOR PRODUCING THEM, POLYMERS THEREOF AND OPTICAL MEMBERS FUJIFILM CORP (JP) 2008-11-19 EP disclosed
EP-1651689-A1 HEAVY-HYDROGENATED NORBORNYL (METH)ACRYLATES, PROCESS FOR PRODUCING THEM, POLYMERS THEREOF AND OPTICAL MEMBERS Fuji Photo Film Co. Ltd. (JP) 2006-05-03 EP disclosed
EP-1651688-A1 HEAVY-HYDROGENATED (METH)ACRYLATES, PROCESS FOR PRODUCING THEM, POLYMERS THEREOF AND OPTICAL MEMBERS FUJI PHOTO FILM CO., LTD. (JP) 2006-05-03 EP disclosed
WO-2005010061-A1 HEAVY-HYDROGENATED NORBORNYL (METH)ACRYLATES, PROCESS FOR PRODUCING THEM, POLYMERS THEREOF AND OPTICAL MEMBERS FUJI PHOTO FILM CO., LTD. (JP) 2005-02-03 WO disclosed
WO-2005010060-A1 HEAVY-HYDROGENATED (METH)ACRYLATES, PROCESS FOR PRODUCING THEM, POLYMERS THEREOF AND OPTICAL MEMBERS FUJI PHOTO FILM CO., LTD. (JP) 2005-02-03 WO disclosed