Styrene

Styrene

SCHEMBL4983182

C=Cc1ccccc1.N.N.O=C(O)/C=C\C(=O)O

nearest known ligand 0.64

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2BTKCACNA1CCACNA1DCACNA1FCACNA1SCCR5CPT1BCPT2DPP4DRD1DRD2EGFRERBB2ERBB4HRH1HRH3HTR1AHTR2AHTR2BHTR2CHTR4JAK1JAK2JAK3MPLMTORPPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PPARGSLC6A2SLC6A3SLC6A4SMOTYK2pol

The experimentally established mechanism targets of Styrene. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.64
TSHR P16473 3/20 0.64
HDAC3 O15379 2/20 0.58
HDAC4 P56524 2/20 0.58
HDAC1 Q13547 2/20 0.58
HDAC2 Q92769 2/20 0.58
HDAC8 Q9BY41 2/20 0.58
HDAC6 Q9UBN7 2/20 0.58
HCAR2 Q8TDS4 2/20 0.58
TNKS O95271 1/20 0.58
HDAC7 Q8WUI4 1/20 0.58
HDAC10 Q969S8 1/20 0.58
HDAC11 Q96DB2 1/20 0.58
TNKS2 Q9H2K2 1/20 0.58
HDAC9 Q9UKV0 1/20 0.58
HDAC5 Q9UQL6 1/20 0.58
MAPT P10636 4/20 0.46
LMNA P02545 3/20 0.46
PLIN1 O60240 2/20 0.46
RECQL P46063 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Styrene SCHEMBL8348915 1.00 ALDH1A1 (0.64) ALDH1A1TSHRHDAC3HDAC4HDAC1
Styrene SCHEMBL29089350 1.00 ALDH1A1 (0.64) ALDH1A1TSHRHDAC3HDAC4HDAC1
Styrene SCHEMBL6344549 0.98 ALDH1A1 (0.67) ALDH1A1TSHRHDAC3HDAC4HDAC1
Styrene SCHEMBL1694231 0.98 ALDH1A1 (0.67) ALDH1A1TSHRHDAC3HDAC4HDAC1
Styrene SCHEMBL122075 0.98 ALDH1A1 (0.67) ALDH1A1TSHRHDAC3HDAC4HDAC1
Styrene SCHEMBL8938902 0.98 ALDH1A1 (0.67) ALDH1A1TSHRHDAC3HDAC4HDAC1
Styrene SCHEMBL122074 0.98 ALDH1A1 (0.67) ALDH1A1TSHRHDAC3HDAC4HDAC1
Styrene SCHEMBL8406802 0.95 ALDH1A1 (0.64) ALDH1A1TSHRHDAC3HDAC4HDAC1
Styrene SCHEMBL8092803 0.95 ALDH1A1 (0.64) ALDH1A1TSHRHDAC3HDAC4HDAC1
Styrene SCHEMBL4349561 0.95 ALDH1A1 (0.64) ALDH1A1TSHRHDAC3HDAC4HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116674080-A Gel injection molding method of high-performance silicon carbide/carbon black ceramic biscuit 中国科学院上海硅酸盐研究所 2023-09-01 CN disclosed
US-11560489-B2 Dispersion liquid of colored resin fine particles for aqueous ink, and aqueous ink composition for writing instruments using same MITSUBISHI PENCIL COMPANY, LIMITED (JP) 2023-01-24 US disclosed
WO-2022270091-A1 ANTIMICROBIAL PARTICLE DISPERSION 三菱鉛筆株式会社 2022-12-29 WO disclosed
WO-2022191071-A1 REDUCING PARTICLE DISPERSION AND AQUEOUS INK COMPOSITION FOR WRITING TOOL CONTAINING SAME 三菱鉛筆株式会社 2022-09-15 WO disclosed
CN-101007478-B Heat-sensitive recording material RICOH CO LTD 2011-08-31 CN disclosed
US-7425522-B2 Thermosensitive recording material RICOH COMPANY, LTD. (JP) 2008-09-16 US disclosed
EP-1810835-B1 Thermosensitive recording material RICOH KK (JP) 2008-09-10 EP disclosed
US-20080090725-A1 Thermosensitive recording material RICOH COMPANY, LTD. (JP) 2008-04-17 US disclosed
US-20070191507-A1 Ink for Ink-Jet Recording, Ink-Jet Recording Apparatus, and Method of Treating Nickel-Containing Metal BROTHER KOGYO KABUSHIKI KAISHA (JP) 2007-08-16 US disclosed
EP-1818375-A1 Ink for ink-jet recording, ink-jet recording apparatus, method of treating nickel-containing metal, treatment agent of nickel-containing metal, and use of a polymer for the manufacture of a treatment agent of nickel-containing metal BROTHER KOGYO KABUSHIKI KAISHA (JP) 2007-08-15 EP disclosed
CN-101007478-A Heat-sensitive recording material RICOH KK (JP) 2007-08-01 CN disclosed
EP-1810835-A1 Thermosensitive recording material Ricoh Company, Ltd. (JP) 2007-07-25 EP disclosed
CN-1789553-A High-gloss spray-painting paper and coating slurry thereof CHEN JIAWEN (CN) 2006-06-21 CN disclosed