Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 1/20 | 0.45 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.43 |
| ▸ | HTT | P42858 | 2/20 | 0.43 |
| ▸ | MAPT | P10636 | 1/20 | 0.43 |
| ▸ | PAX8 | Q06710 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.39 |
| ▸ | GPR35 | Q9HC97 | 1/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.38 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL59186 | 0.88 | ALDH1A1 (0.49) | TSHRALDH1A1HTTMAPTPAX8 | |
| SCHEMBL16156460 | 0.86 | HPGD (0.41) | ALDH1A1MAPTKMT2AMEN1TDP1 | |
| SCHEMBL59130 | 0.83 | ALDH1A1 (0.47) | TSHRALDH1A1HTTMAPTPAX8 | |
| SCHEMBL30355298 | 0.83 | ALDH1A1 (0.43) | TSHRALDH1A1HTTMAPTPAX8 | |
| SCHEMBL28856088 | 0.81 | ALDH1A1 (0.44) | TSHRALDH1A1HTTMAPTPAX8 | |
| SCHEMBL9550116 | 0.80 | ALDH1A1 (0.44) | TSHRALDH1A1HTTMAPTPAX8 | |
| SCHEMBL6105419 | 0.78 | ALDH1A1 (0.48) | TSHRALDH1A1HTTMAPTPAX8 | |
| SCHEMBL556153 | 0.78 | ACHE (0.46) | TSHRKMT2AMEN1RAB9A | |
| SCHEMBL27966350 | 0.78 | MAPT (0.48) | ALDH1A1HTTMAPTPAX8KMT2A | |
| SCHEMBL32679667 | 0.78 | ALDH1A1 (0.48) | TSHRALDH1A1HTTMAPTPAX8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 328 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119978604-A | Polymer film composition, polymer film, and laminate | 福斯特(滁州)新材料有限公司 | 2025-05-13 | — | — | CN | claimed |
| CN-113929906-A | Self-crosslinkable isocyanurate polymer and anti-reflective coating composition, preparation method thereof and pattern forming method | 厦门恒坤新材料科技股份有限公司 | 2022-01-14 | — | — | CN | claimed |
| US-20140238256-A1 | ENVIRONMENT FRIENDLY WATERLESS OFFSET PLATE | INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCES (CN) | 2014-08-28 | — | — | US | claimed |
| US-6858371-B2 | Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same | HYNIX SEMICONDUCTOR INC. (KR) | 2005-02-22 | — | — | US | claimed |
| US-6749990-B2 | UNSATURATED HALOGENATED HYDROCARBON AS PHOTORESIST MONOMER, FOR EXAMPLE 3,3,4,4,5,5,6,6,6-NONAFLUORO-1-HEXENE; ETCHING RESISTANCE, HEAT RESISTANCE AND ADHESIVENESS, AND IS DEVELOPABLE IN AQUEOUS TETRAMETHYLAMMONIUM HYDROXIDE | HYNIX SEMICONDUCTOR INC. (KR) | 2004-06-15 | — | — | US | claimed |
| US-6737217-B2 | SUCH AS POLY(MALEIC ANHYDRIDE/HEXAFLUOROBUTYL-5-NORBORNENE-2-CARBOXYLATE/2,6-DIFLUORO-1 -METHYLBENZYLACRYLATE) ; FOR PRODUCTION OF SEMICONDUCTORS/INTEGRATED CIRCUITS; PHOTOLITHOGRAPHY | HYNIX SEMICONDUCTOR INC. (KR) | 2004-05-18 | — | — | US | claimed |
| US-6720129-B2 | PHOTORESIST COMPRISING FLUOROALKYLATED UNITS OF PHTHALIMIDE AND NORBORNENE-BASED ESTERS SUCH AS 2-METHOXYBUTYL-2-ADAMANTANYL 5-NORBORNENE-2-CARBOXYLATE; ETCH RESISTANCE, HEAT RESISTANCE AND ADHESIVENESS | HYNIX SEMICONDUCTOR INC (KR) | 2004-04-13 | — | — | US | claimed |
| US-6653047-B2 | Monomers such as 2,6-difluoro-1-methylbenzyl 5-norbornene-2-carboxylate; etching resistance, heat resistance and adhesiveness, and can be developed in aqueous tetramethylammonium hydroxide; semiconductors | HYNIX SEMICONDUCTOR INC (KR) | 2003-11-25 | — | — | US | claimed |
| US-20030022103-A1 | Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-30 | — | — | US | claimed |
| US-20030017412-A1 | Photoresist monomers containing fluorine-substituted benzylcarboxylate and photoresist polymers comprising the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-23 | — | — | US | claimed |
| US-20030017404-A1 | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-23 | — | — | US | claimed |
| US-20030013037-A1 | Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same | HYNIX SEMICONDUCTOR INC. (KR) | 2003-01-16 | — | — | US | claimed |
| US-20020164541-A1 | Maleimide-photoresist polymers containing fluorine and photoresist compositions comprising the same | HYNIX SEMICONDUCTOR, INC. (KR) | 2002-11-07 | — | — | US | claimed |
| US-12631964-B2 | Resist underlayer film-forming composition | NISSAN CHEMICAL CORPORATION (JP) | 2026-05-19 | — | — | US | disclosed |
| EP-4667537-A1 | PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-12-24 | — | — | EP | disclosed |
| US-20250382500-A1 | PRIMER COMPOSITION, LAMINATE, AND METHOD FOR PRODUCING LAMINATE | TOKYO OHKA KOGYO CO LTD (JP) | 2025-12-18 | — | — | US | disclosed |
| WO-2002006895-A1 | T-BUTYL CINNAMATE POLYMERS AND THEIR USE IN PHOTORESIST COMPOSITIONS | ARCH SPECIALTY CHEMICALS, INC (US) | 2002-01-24 | — | — | WO | disclosed |
| EP-1164435-A1 | PHOTOSENSITIVE POLYSILAZANE COMPOSITION AND METHOD OF FORMING PATTERNED POLYSILAZANE FILM | TonenGeneral Sekiyu K.K. (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-5668226-A | 2,4-diamino-s-triazinyl group-containing polymer and negative radiation-sensitive resist composition containing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-09-16 | — | — | US | disclosed |
| US-5618892-A | 2,4-diamino-s-triazinyl group-containing polymer and negative radiation-sensitive resist composition containing the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1997-04-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20030017404-A1 | Chemical amplification photoresist monomers, polymers therefrom and photoresist compositions containing the same | ETV6, UFM1, UTS2R | TSHR 1899/4885ALDH1A1 310/4885HTT 2579/4885 |
| US-12631964-B2 | Resist underlayer film-forming composition | TET1, OGG1, TET3 | TSHR 3811/4885ALDH1A1 2237/4885HTT 4033/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.