SCHEMBL4995342

SCHEMBL4995342

O=S(=O)(OS1(c2ccc(F)c3ccccc23)CCCC1)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.35

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.35
TSHR P16473 1/20 0.35
SLC6A4 P31645 1/20 0.33
SLC6A3 Q01959 1/20 0.33
GAA P10253 1/20 0.33
HTT P42858 1/20 0.33
NPSR1 Q6W5P4 1/20 0.33
CA1 P00915 3/20 0.31
CA2 P00918 3/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL702252 0.85 ALDH1A1 (0.36) ALDH1A1TSHRGAAHTTNPSR1
SCHEMBL704510 0.84 ALDH1A1 (0.35) ALDH1A1TSHRHTTNPSR1CA1
SCHEMBL3119750 0.82 TSHR (0.42) ALDH1A1TSHRGAAHTTNPSR1
SCHEMBL704518 0.82 TSHR (0.41) ALDH1A1TSHRGAAHTTNPSR1
SCHEMBL3970511 0.81
SCHEMBL3969489 0.81 HTT (0.32) ALDH1A1TSHRHTT
SCHEMBL701333 0.81 KMT2A (0.41) ALDH1A1TSHRHTTCA1CA2
SCHEMBL3965647 0.81 FABP4 (0.36) SLC6A4HTTNPSR1CA1CA2
SCHEMBL3970533 0.80 CA1 (0.32) CA1CA2
SCHEMBL3973475 0.80 CA1 (0.36) SLC6A4HTTNPSR1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7371503-B2 Sulfonium salt compound, photoacid generator, and positive-tone radiation-sensitive resin composition JSR CORPORATION (JP) 2008-05-13 US disclosed
US-20060141383-A1 Sulfonium salts, radiation- sensitive acid generators, and positive radiator-sensitive resin compositions JSR CORPORATION (JP) 2006-06-29 US disclosed
EP-1586570-A1 SULFONIUM SALTS, RADIATION-SENSITIVE ACID GENERATORS, AND POSITIVE RADIATION-SENSITIVE RESIN COMPOSITIONS JSR Corporation (JP) 2005-10-19 EP disclosed