SCHEMBL4996476

SCHEMBL4996476

Nc1ccc(S(=O)(=O)c2ccc(N)c(C(=O)O)c2)cc1

nearest known ligand 0.68

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ PKM P14618 3/20 0.68
▸ HTR6 P50406 3/20 0.68
▸ ALDH1A1 P00352 3/20 0.68
▸ KMT2A Q03164 3/20 0.59
▸ POLB P06746 2/20 0.59
▸ APEX1 P27695 2/20 0.59
▸ MEN1 O00255 2/20 0.59
▸ MAPT P10636 2/20 0.59
▸ USP2 O75604 1/20 0.59
▸ THRB P10828 1/20 0.59
▸ RECQL P46063 1/20 0.59
▸ BLM P54132 1/20 0.59
▸ MCL1 Q07820 1/20 0.59
▸ TDP1 Q9NUW8 1/20 0.59
▸ TSHR P16473 2/20 0.55
▸ LMNA P02545 1/20 0.55
▸ MPO P05164 1/20 0.55
▸ CYP3A4 P08684 1/20 0.55
▸ CYP2C9 P11712 1/20 0.55
▸ KDM4E B2RXH2 2/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL715377 0.93 KDM4E (0.59) PKMHTR6ALDH1A1KMT2APOLB
SCHEMBL8372993 0.90 HTR6 (0.53) PKMHTR6ALDH1A1KMT2APOLB
SCHEMBL9647581 0.88 APEX1 (0.60) PKMHTR6ALDH1A1KMT2APOLB
SCHEMBL4953135 0.86 PKM (0.68) PKMHTR6ALDH1A1KMT2APOLB
SCHEMBL728291 0.81 HTR6 (1.00) PKMHTR6ALDH1A1KMT2AMEN1
SCHEMBL30771551 0.81 HTR6 (1.00) PKMHTR6ALDH1A1KMT2AMEN1
SCHEMBL344115 0.80 KDM4E (0.63) PKMALDH1A1KMT2APOLBAPEX1
SCHEMBL342600 0.80 ALDH1A1 (0.62) PKMALDH1A1KMT2APOLBAPEX1
SCHEMBL11088635 0.80 KMT2A (0.56) PKMHTR6ALDH1A1KMT2APOLB
SCHEMBL1553291 0.79 POLB (0.58) PKMALDH1A1KMT2APOLBAPEX1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8211613-B2 prints, color filters, electronics, layer insulation films, wire covering films, optics, circuits, antireflection films, holograms and construction materials comprising a cured mixture of photosensitive resins and photoiniitiators having a naphthalimide structure DAI NIPPON PRINTING CO., LTD. (JP) 2012-07-03 — — US disclosed
US-20080275154-A1 Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition SAKAYORI KATSUYA 2008-11-06 — — US disclosed
US-7410746-B2 Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition DAI NIPPON PRINTING CO., LTD. (JP) 2008-08-12 — — US disclosed
US-20040023159-A1 Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition DAI NIPPON PRINTING CO., LTD. (JP) 2004-02-05 — — US disclosed
US-6524770-B1 For polyimide precursor curable under patternwise low radiation; heat and chemical resistance; polyamide having unsaturated ester pendant groups cures HITACHI CHEMICAL CO., LTD. (JP) 2003-02-25 — — US disclosed
Send feedback