SCHEMBL4997154

SCHEMBL4997154

O=C(Cl)C12CC3CC(C1)CC(C14CC5CC(CC(C(=O)Cl)(C5)C1)C4)(C3)C2

nearest known ligand 0.43

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
THRB P10828 1/20 0.43
SMN1; SMN2 Q16637 2/20 0.42
LMNA P02545 1/20 0.42
MEN1 O00255 1/20 0.41
KMT2A Q03164 1/20 0.41
GAA P10253 2/20 0.40
MAPK1 P28482 1/20 0.39
HSD11B1 P28845 3/20 0.37
L3MBTL1 Q9Y468 2/20 0.37
PKM P14618 1/20 0.37
ALDH1A1 P00352 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35
TSHR P16473 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL692431 0.88 SMN1; SMN2 (0.52) THRBSMN1; SMN2LMNAMEN1KMT2A
SCHEMBL12104099 0.86 THRB (0.41) THRBLMNAGAAL3MBTL1ALDH1A1
SCHEMBL2746270 0.82 L3MBTL1 (0.53) THRBSMN1; SMN2LMNAMEN1KMT2A
SCHEMBL5562998 0.80 L3MBTL1 (0.51) THRBSMN1; SMN2LMNAMEN1KMT2A
SCHEMBL966107 0.80 THRB (0.65) THRBSMN1; SMN2LMNAMEN1KMT2A
SCHEMBL3188989 0.80 HSD11B1 (0.56) THRBSMN1; SMN2LMNAMEN1KMT2A
Hydrochloric Acid SCHEMBL5004428 0.80 L3MBTL1 (0.56) THRBSMN1; SMN2LMNAMEN1KMT2A
Hydrochloric Acid SCHEMBL4997164 0.80 L3MBTL1 (0.56) THRBSMN1; SMN2LMNAMEN1KMT2A
SCHEMBL5806269 0.78 LMNA (0.46) THRBSMN1; SMN2LMNAMEN1KMT2A
SCHEMBL7719840 0.78 POLB (0.50) THRBSMN1; SMN2LMNAMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed