SCHEMBL499880

SCHEMBL499880

CC(=O)OCCC(CC(=O)O)N1CCOCC1

nearest known ligand 0.48

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.43
NPSR1 Q6W5P4 2/20 0.40
LMNA P02545 3/20 0.40
ALDH1A1 P00352 2/20 0.40
KMT2A Q03164 2/20 0.40
MAPT P10636 1/20 0.40
HPGD P15428 1/20 0.40
RAB9A P51151 1/20 0.40
POLB P06746 2/20 0.37
MAPK1 P28482 1/20 0.37
TSHR P16473 1/20 0.35
HSD17B10 Q99714 2/20 0.34
SMN1; SMN2 Q16637 2/20 0.34
MEN1 O00255 1/20 0.33
RECQL P46063 1/20 0.33
ALOX15 P16050 1/20 0.33
GLA P06280 1/20 0.33
KDM4E B2RXH2 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL500329 0.85 L3MBTL1 (0.42) L3MBTL1NPSR1LMNAALDH1A1KMT2A
SCHEMBL499960 0.77 POLB (0.40) L3MBTL1NPSR1LMNAALDH1A1KMT2A
SCHEMBL500356 0.76 ALDH1A1 (0.44) L3MBTL1NPSR1LMNAALDH1A1KMT2A
SCHEMBL16075545 0.71 LMNA (0.46) L3MBTL1NPSR1LMNAALDH1A1KMT2A
SCHEMBL499879 0.71 ALDH1A1 (0.50) L3MBTL1NPSR1LMNAALDH1A1KMT2A
SCHEMBL6214649 0.69 HTT (0.38) L3MBTL1NPSR1LMNAALDH1A1KMT2A
SCHEMBL500092 0.69 ALDH1A1 (0.46) L3MBTL1NPSR1LMNAALDH1A1KMT2A
Dioxane SCHEMBL11353341 0.69 ALOX15 (0.44) LMNAALDH1A1KMT2ARAB9APOLB
SCHEMBL3969603 0.68 L3MBTL1 (0.59) L3MBTL1NPSR1LMNAALDH1A1KMT2A
SCHEMBL4808378 0.68 POLB (0.35) L3MBTL1NPSR1KMT2APOLBMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8105760-B2 Patterning process and pattern surface coating composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-31 US disclosed
US-20090053657-A1 PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-26 US disclosed