SCHEMBL5000910

SCHEMBL5000910

C#Cc1ccc(C23CC4CC(C)(CC(C)(C4)C2)C3)cc1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.40
PGR P06401 10/20 0.40
GRIN1 Q05586 5/20 0.37
GRIN2A Q12879 5/20 0.37
GRIN2D O15399 4/20 0.37
GRIN3B O60391 4/20 0.37
GRIN2B Q13224 4/20 0.37
GRIN2C Q14957 4/20 0.37
GRIN3A Q8TCU5 4/20 0.37
LMNA P02545 3/20 0.35
SLC22A1 O15245 1/20 0.35
ESR1 P03372 1/20 0.35
ADRB3 P13945 1/20 0.35
ACHE P22303 1/20 0.35
OPRK1 P41145 1/20 0.35
MTOR P42345 1/20 0.35
HTT P42858 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
CYP2C9 P11712 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6368529 0.86 PGR (0.46) PGRGRIN1GRIN2AGRIN2DGRIN3B
SCHEMBL4061240 0.86 EPHX2 (0.34) EPHX2PGRGRIN1GRIN2AGRIN2D
SCHEMBL29038978 0.85 PGR (0.55) EPHX2PGRGRIN1GRIN2AGRIN2D
SCHEMBL8516335 0.84 GRIN1 (0.37) EPHX2PGRGRIN1GRIN2AGRIN2D
SCHEMBL2710984 0.84 GRIN1 (0.37) EPHX2PGRGRIN1GRIN2AGRIN2D
SCHEMBL3841781 0.80 MEN1 (0.39) EPHX2PGRLMNAESR1ACHE
SCHEMBL3179232 0.78 MEN1 (0.45) EPHX2PGRGRIN1GRIN2AGRIN2D
SCHEMBL22453128 0.78 LMNA (0.56) EPHX2PGRGRIN1GRIN2AGRIN2D
SCHEMBL5006770 0.78 EPHX2 (0.46) EPHX2GRIN1GRIN2AGRIN2DGRIN3B
SCHEMBL28090104 0.78 GRIN1 (0.49) EPHX2GRIN1GRIN2AGRIN2DGRIN3B

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8337982-B2 Comprising first repeating unit obtained by reaction of bisaminophenol compound and dicarboxylic acid, at least one of which has diamondoid structure and second repeating unit obtained by reaction of bisaminophenol compound having no diamondoid structure and dicarboxylic acid; heat resistance SUMITOMO BAKELITE CO., LTD. (JP) 2012-12-25 US disclosed
CN-101128514-B Benzoxazole resin precursor, polybenzoxazole resin, resin film and semiconductor device SUMITOMO BAKELITE CO 2011-05-25 CN disclosed
US-20080206548-A1 Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device SUMITOMO BAKELITE CO., LTD (JP) 2008-08-28 US disclosed
CN-101128514-A Benzoxazole resin precursor, polybenzoxazole resin, resin film and semiconductor device SUMITOMO BAKELITE CO (JP) 2008-02-20 CN disclosed
EP-1832619-A1 BENZOXAZOLE RESIN PRECURSOR, POLYBENZOXAZOLE RESIN, RESIN FILM, AND SEMICONDUCTOR DEVICE Sumitomo Bakelite Company, Limited (JP) 2007-09-12 EP disclosed