Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
| ▸ | DPP7 | Q9UHL4 | 1/20 | 0.34 |
| ▸ | REN | P00797 | 1/20 | 0.33 |
| ▸ | ACE | P12821 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.32 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL499885 | 0.74 | NPSR1 (0.61) | NPSR1L3MBTL1MAPK1CYP2C9HPGD | |
| SCHEMBL10566713 | 0.73 | SLC6A3 (0.48) | NPSR1L3MBTL1DPP7CYP1A2MAPK1 | |
| SCHEMBL10025245 | 0.71 | SLC6A3 (0.49) | NPSR1L3MBTL1DPP7RENACE | |
| SCHEMBL500155 | 0.69 | DPP7 (0.35) | DPP7RENACECYP1A2MAPK1 | |
| SCHEMBL2066730 | 0.69 | SLC22A6 (0.50) | CYP1A2CYP2C9CYP2C19ALDH1A1SMN1; SMN2 | |
| SCHEMBL2066729 | 0.69 | SLC22A6 (0.50) | CYP1A2CYP2C9CYP2C19ALDH1A1SMN1; SMN2 | |
| SCHEMBL14346068 | 0.69 | SLC22A6 (0.50) | CYP1A2CYP2C9CYP2C19ALDH1A1SMN1; SMN2 | |
| SCHEMBL6035097 | 0.69 | SLC22A6 (0.50) | CYP1A2CYP2C9CYP2C19ALDH1A1SMN1; SMN2 | |
| SCHEMBL500098 | 0.68 | ALDH1A1 (0.39) | NPSR1L3MBTL1DPP7CYP1A2MAPK1 | |
| SCHEMBL8570633 | 0.67 | BHMT (0.37) | RENACECYP1A2CYP2C9CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8105760-B2 | Patterning process and pattern surface coating composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-01-31 | — | — | US | disclosed |
| US-20090053657-A1 | PATTERNING PROCESS AND PATTERN SURFACE COATING COMPOSITION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-02-26 | — | — | US | disclosed |