Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 5/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.31 |
| ▸ | TP53 | P04637 | 2/20 | 0.31 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5014835 | 0.82 | TSHR (0.32) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL8965849 | 0.73 | TSHR (0.41) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL5024466 | 0.73 | TSHR (0.36) | TSHRALDH1A1 | |
| SCHEMBL2137705 | 0.71 | — | — | |
| SCHEMBL4197867 | 0.71 | — | — | |
| SCHEMBL549537 | 0.71 | — | — | |
| SCHEMBL9546119 | 0.70 | TSHR (0.38) | TSHRALDH1A1TP53HIF1ACYP3A4 | |
| SCHEMBL11193107 | 0.70 | — | — | |
| SCHEMBL27995286 | 0.70 | — | — | |
| SCHEMBL11233280 | 0.70 | TSHR (0.41) | TSHRALDH1A1TP53HIF1ACYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7393911-B2 | Organosilicon fine particles and method of producing same | TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) | 2008-07-01 | — | — | US | disclosed |
| US-20060089478-A1 | antireflection and antiblocking characteristics to synthetic polymer films and sheets when applied to their surface or caused to be contained, respectively, and adherence and slip characteristics to a skin care cosmetic material when caused to be contained | TAKEMOTO YUSHI KABUSHIKI KAISHA (JP) | 2006-04-27 | — | — | US | disclosed |