SCHEMBL501662

SCHEMBL501662

C=C(C)C(=O)OC12CC3CC(C1)CC(C(=O)OCC(F)(F)S(=O)(=O)[O-])(C3)C2.c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.34

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.34
ALDH1A1 P00352 6/20 0.34
TP53 P04637 1/20 0.34
LMNA P02545 4/20 0.34
GAA P10253 2/20 0.32
HTT P42858 1/20 0.31
TSHR P16473 1/20 0.30
MEN1 O00255 2/20 0.30
KMT2A Q03164 2/20 0.30
RECQL P46063 1/20 0.30
POLB P06746 1/20 0.30
NPSR1 Q6W5P4 2/20 0.30
MAPT P10636 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL544306 0.83 ALDH1A1 (0.43) ALDH1A1LMNAGAATSHRKMT2A
SCHEMBL1318815 0.83 L3MBTL1 (0.30) L3MBTL1
SCHEMBL19042196 0.82 NPSR1 (0.36) L3MBTL1ALDH1A1LMNAMEN1KMT2A
SCHEMBL10134899 0.82 NPSR1 (0.36) L3MBTL1ALDH1A1LMNAMEN1KMT2A
SCHEMBL31676706 0.80 ALDH1A1 (0.39) ALDH1A1LMNAGAAMEN1KMT2A
SCHEMBL1635900 0.80 SCN9A (0.32)
SCHEMBL12376702 0.79 GAA (0.41) L3MBTL1ALDH1A1TP53LMNAGAA
SCHEMBL1398384 0.79 ALDH1A1 (0.38) ALDH1A1LMNAGAAMEN1KMT2A
SCHEMBL26238604 0.78 NPSR1 (0.40) L3MBTL1ALDH1A1LMNATSHRMEN1
SCHEMBL12376788 0.77 NPSR1 (0.39) L3MBTL1ALDH1A1LMNATSHRMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8808966-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2014-08-19 US disclosed
US-20130029269-A1 POSITIVE RESIST COMPOSITION AND PATTTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2013-01-31 US disclosed
US-8105748-B2 Polymerizable anion-containing sulfonium salt and polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-01-31 US disclosed
US-20100099042-A1 POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-04-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20100099042-A1 POLYMERIZABLE ANION-CONTAINING SULFONIUM SALT AND POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS ARSA, ACSL3, ASH2L L3MBTL1 2339/4885ALDH1A1 3135/4885TP53 3735/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.