Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCA | P17252 | 1/20 | 0.42 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | GAA | P10253 | 1/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | ELANE | P08246 | 5/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
| ▸ | BTN3A1 | O00481 | 3/20 | 0.33 |
| ▸ | NPC1 | O15118 | 2/20 | 0.33 |
| ▸ | CASP3 | P42574 | 1/20 | 0.33 |
| ▸ | RAB9A | P51151 | 1/20 | 0.33 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.33 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.33 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12895536 | 0.81 | PRKCA (0.41) | PRKCAPOLBGAANPSR1ELANE | |
| SCHEMBL17486700 | 0.81 | PRKCA (0.41) | PRKCAPOLBGAANPSR1ELANE | |
| SCHEMBL2170271 | 0.81 | PRKCA (0.41) | PRKCAPOLBGAANPSR1ELANE | |
| SCHEMBL2692345 | 0.81 | HTT (0.50) | PRKCAPOLBGAANPSR1ELANE | |
| SCHEMBL15842816 | 0.81 | PRKCA (0.35) | PRKCA | |
| SCHEMBL2693201 | 0.77 | PRKCA (0.38) | PRKCAPOLBGAANPSR1ELANE | |
| SCHEMBL12135291 | 0.77 | PRKCA (0.38) | PRKCAPOLBGAANPSR1ELANE | |
| SCHEMBL16213966 | 0.77 | PRKCA (0.38) | PRKCAPOLBGAANPSR1ELANE | |
| SCHEMBL2304849 | 0.76 | — | — | |
| SCHEMBL24361125 | 0.76 | PRKCA (0.37) | PRKCAPOLBGAANPSR1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9983475-B2 | Fluorinated sulfonate esters of aryl ketones for non-ionic photo-acid generators | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2018-05-29 | — | — | US | disclosed |
| US-20180046077-A1 | FLUORINATED SULFONATE ESTERS OF ARYL KETONES FOR NON-IONIC PHOTO-ACID GENERATORS | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2018-02-15 | — | — | US | disclosed |
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2256551-B1 | Pattern forming process using a chemically amplified resist composition | SHINETSU CHEMICAL CO (JP) | 2015-05-13 | — | — | EP | disclosed |
| US-8748672-B2 | 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-06-10 | — | — | US | disclosed |
| US-8748672-B2 | 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-06-10 | — | — | US | disclosed |
| US-8748672-B2 | 2-(alkylcarbonyloxy)-1, 1-difluoroethanesulfonic acid salt and method for producing the same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-06-10 | — | — | US | disclosed |
| US-8663897-B2 | Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8663897-B2 | Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-8663897-B2 | Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2014-03-04 | — | — | US | disclosed |
| US-20090269696-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090269696-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090269696-A1 | SULFONIUM SALT-CONTAINING POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| EP-2112554-A2 | Sulfonium salt-containing polymer, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-10-28 | — | — | EP | disclosed |
| US-20090246694-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-10-01 | — | — | US | disclosed |
| EP-2105794-A1 | Novel photoacid generator, resist composition, and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-09-30 | — | — | EP | disclosed |
| EP-2090931-A1 | Positive resist composition and patterning process | Shin-Etsu Chemical Co., Ltd. (JP) | 2009-08-19 | — | — | EP | disclosed |
| US-20090202943-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-13 | — | — | US | disclosed |
| US-20090202943-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-13 | — | — | US | disclosed |
| US-20090202943-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20090246694-A1 | NOVEL PHOTOACID GENERATOR, RESIST COMPOSITION, AND PATTERNING PROCESS | ASIC1, HAO2, HRH3 | PRKCA 2200/4885POLB 2181/4885GAA 4197/4885 |
| US-20180046077-A1 | FLUORINATED SULFONATE ESTERS OF ARYL KETONES FOR NON-IONIC PHOTO-ACID GENERATORS | PFAS, PLG, PPARG | PRKCA 312/4885POLB 18/4885GAA 1140/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.