SCHEMBL501891

SCHEMBL501891

COC1(OC)C=CC=CC1CC(=O)c1ccccc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 2/20 0.39
LMNA P02545 2/20 0.39
KMT2A Q03164 5/20 0.38
MAPT P10636 5/20 0.38
NPC1 O15118 5/20 0.38
RAB9A P51151 5/20 0.38
SMN1; SMN2 Q16637 4/20 0.38
L3MBTL1 Q9Y468 3/20 0.38
ALDH1A1 P00352 6/20 0.37
MEN1 O00255 4/20 0.37
MAPK1 P28482 3/20 0.37
HPGD P15428 3/20 0.37
KDM4E B2RXH2 2/20 0.37
ALOX15 P16050 2/20 0.37
CYP3A4 P08684 1/20 0.37
CES1 P23141 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
TP53 P04637 1/20 0.37
HTT P42858 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL183220 0.87 KMT2A (0.39) POLBLMNAKMT2AMAPTNPC1
SCHEMBL10448957 0.81 MAPT (0.40) LMNAKMT2AMAPTNPC1RAB9A
SCHEMBL28638666 0.79 ALDH1A1 (0.41) LMNAKMT2AMAPTNPC1RAB9A
SCHEMBL4824634 0.78 ALDH1A1 (0.39) POLBLMNAKMT2AMAPTNPC1
SCHEMBL6400883 0.78 NPC1 (0.39) POLBLMNAKMT2AMAPTNPC1
SCHEMBL10959754 0.75 NPC1 (0.40) KMT2AMAPTNPC1SMN1; SMN2L3MBTL1
SCHEMBL29113696 0.74
SCHEMBL28380002 0.72 CES2 (0.39) LMNAKMT2AMAPTNPC1RAB9A
SCHEMBL7132195 0.72 ALDH1A1 (0.38) LMNAKMT2AMAPTNPC1RAB9A
SCHEMBL10867266 0.70 MMP9 (0.39) POLBLMNAKMT2AMAPTNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 538 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121559814-B Ultraviolet curing nano-imprint photoresist with semi-interpenetrating network structure and preparation method thereof 中国科学技术大学 2026-05-12 CN claimed
CN-119556529-B High-mechanical-strength and high-resolution nano-imprint photoresist and ink-jet printing method thereof 中国科学技术大学 2025-05-20 CN claimed
CN-119613439-A Compound, acrylic resin, planarization layer composition and application 渭南高新区海泰新型电子材料有限责任公司 2025-03-14 CN claimed
CN-119556529-A High-mechanical-strength and high-resolution nano-imprint photoresist and ink-jet printing method thereof 中国科学技术大学 2025-03-04 CN claimed
CN-119529447-A Anti-adhesion low-temperature-resistant material and preparation method and application thereof 河南省驼人医疗科技有限公司 2025-02-28 CN claimed
CN-119518083-A Double-layer polymer solid electrolyte, preparation method thereof and lithium ion battery 南方科技大学 2025-02-25 CN claimed
CN-119431150-A Acrylic resin and preparation method thereof, adhesive and preparation method thereof 合肥中聚和成电子材料有限公司 2025-02-14 CN claimed
CN-119145233-A Hydrophobic non-woven fabric and preparation method thereof 广州俊麒无纺布企业有限公司 2024-12-17 CN claimed
CN-119078337-A Production process of bio-based waterproof and moisture permeable glove lining material 伊帆特纺织品(上海)有限公司 2024-12-06 CN claimed
CN-119055845-A Coating, method for forming coating, and medical device 巴迪脉通医疗科技(苏州)有限公司 2024-12-03 CN claimed
CN-104027852-A Surface modifying method for biological material HUAIYIN INST TECHNOLOGY 2014-09-10 CN claimed
CN-103819591-A Copper nano wire/polyacrylate composite material and preparation method thereof SHANGHAI INST CERAMICS 2014-05-28 CN claimed
EP-2644348-A1 A method of manufacturing an artificial elastic implant for restorative and reconstructive surgery Icon Lab GmbH (DE) 2013-10-02 EP claimed
US-6734221-B1 A PHOTOINITIATED RADICAL GENERATING COMPONENT AND A PHOTOINITIATOR COMPONENT LOCTITE (R&D) LIMITED (IE) 2004-05-11 US claimed
EP-0624825-B1 Photosensitive polymer composition for flexographic printing plates processable in aqueous media PT SUB INC (US) 1999-06-16 EP claimed
US-5736298-A COMPRISES A PARTICULATE POLYMER OF A CARBOXY-GROUP-CONTAINING-DIENE HAVING A CROSSLINKED STRUCTURE JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-04-07 US claimed
EP-0607962-B1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1996-07-17 EP claimed
EP-0607962-A1 Photosensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1994-07-27 EP claimed
US-5242782-A Flexographic printing plate ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1993-09-07 US claimed
EP-0104324-B1 RADIATION HARDENED LIFT-OFF CORRECTION MEDIUM AND PROCESS OF MANUFACTURE International Business Machines Corporation (US) 1986-09-10 EP claimed