SCHEMBL503179

SCHEMBL503179

O=C(O)CCC(=O)c1ccc2c(c1)CCc1ccccc1-2

nearest known ligand 0.67

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 5/20 0.67
SRD5A1 P18405 4/20 0.67
RAB9A P51151 3/20 0.57
MITF O75030 1/20 0.57
HSP90AA1 P07900 1/20 0.57
NR4A2 P43354 1/20 0.51
CYP1A2 P05177 2/20 0.50
FFAR1 O14842 1/20 0.50
LMNA P02545 1/20 0.50
SMN1; SMN2 Q16637 1/20 0.50
HIF1A Q16665 1/20 0.50
KDM4E B2RXH2 1/20 0.48
L3MBTL1 Q9Y468 1/20 0.48
ALDH1A1 P00352 1/20 0.47
GAA P10253 1/20 0.47
CYP2C19 P33261 1/20 0.47
CTNNB1 P35222 1/20 0.47
WNT3A P56704 1/20 0.47
PKM P14618 1/20 0.47
TSHR P16473 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8535923 0.89 SRD5A2 (0.69) SRD5A2SRD5A1RAB9ANR4A2CYP1A2
SCHEMBL1114930 0.84 RAB9A (0.56) SRD5A2RAB9ANR4A2CYP1A2FFAR1
SCHEMBL5687425 0.81 SRD5A2 (0.66) SRD5A2SRD5A1RAB9AMITFHSP90AA1
SCHEMBL10081754 0.80 SRD5A2 (1.00) SRD5A2SRD5A1RAB9AMITFHSP90AA1
SCHEMBL11818520 0.79 SRD5A2 (0.77) SRD5A2SRD5A1RAB9AMITFHSP90AA1
SCHEMBL8941746 0.76 SRD5A2 (0.72) SRD5A2SRD5A1RAB9AMITFHSP90AA1
SCHEMBL29809406 0.76 SRD5A2 (0.72) SRD5A2SRD5A1RAB9AMITFHSP90AA1
SCHEMBL7786912 0.75 SRD5A2 (0.66) SRD5A2SRD5A1RAB9AMITFHSP90AA1
SCHEMBL503763 0.75 CYP1A2 (0.55) SRD5A2SRD5A1RAB9AMITFHSP90AA1
Dihydrophenanthrene SCHEMBL8927840 0.74 SRD5A1 (0.47) SRD5A2SRD5A1RAB9AMITFHSP90AA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8435718-B2 Upper layer-forming composition and photoresist patterning method JSR CORPORATION (JP) 2013-05-07 US disclosed
EP-1950610-B1 IMMERSION LITHOGRAPHIC COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN JSR CORP (JP) 2012-05-02 EP disclosed
US-20120028198-A1 UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD JSR CORPORATION (JP) 2012-02-02 US disclosed
US-20100003615-A1 UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD JSR CORPORATION (JP) 2010-01-07 US disclosed