Trimethylammonium

Trimethylammonium

SCHEMBL50323

CN(C)C.O

nearest known ligand 0.00

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Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Trimethylammonium. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3562 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122079951-A Acid-base strippable diacrylate and preparation method and application thereof 2026-05-26 CN claimed
CN-118022818-B Isomerization method of o-cresol and catalyst used in isomerization method ZHEJIANG XINHUA CHEMICAL CO.,LTD. (CN) 2026-05-26 CN claimed
CN-122074126-A Photosensitive composition, transfer film, method for producing laminate, and semiconductor package 富士胶片株式会社 2026-05-22 CN claimed
CN-121573719-A WO3@FeWO4Core-shell nano structure, preparation method and application thereof in rice quality detection 郑州轻工业大学 2026-02-27 CN claimed
US-20250228125-A1 LIGHT EMITTING ELEMENT, METHOD FOR MANUFACTURING THE LIGHT EMITTING ELEMENT, AND DISPLAY DEVICE COMPRISING THE LIGHT EMITTING ELEMENT SAMSUNG DISPLAY CO., LTD. (KR) 2025-07-10 US claimed
CN-120138654-A Method for synthesizing adiponitrile by electro-oxidizing propionitrile 万华化学集团股份有限公司 2025-06-13 CN claimed
CN-120115199-A Magnetic ion exchange resin, preparation method and application thereof 中铁上海工程局集团有限公司 2025-06-10 CN claimed
WO-2025105281-A1 PHOTOSENSITIVE COMPOSITION, TRANSFER FILM, LAMINATE PRODUCTION METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE 富士フイルム株式会社 2025-05-22 WO claimed
CN-111809182-B Etching solution for copper/molybdenum (niobium)/IGZO film layer and preparation method and application thereof 江苏和达电子科技有限公司 2025-04-18 CN claimed
CN-119855371-A Light emitting element, method for manufacturing light emitting element, and display device 三星显示有限公司 2025-04-18 CN claimed
EP-0394666-B1 TETRAAZA LIGAND SYSTEMS AS COMPLEXING AGENTS FOR ELECTROLESS DEPOSITION OF COPPER International Business Machines Corporation (US) 1993-10-06 EP claimed
EP-0268982-B1 COSMETIC COMPOSITIONS CONTAINING MICROEMULSIONS OF DIMETHYLPOLYSILOXANE Toray Silicone Company, Ltd. (JP) 1992-03-25 EP claimed
EP-0463423-A1 Surface treating agent for aluminum line pattern substrate MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 1992-01-02 EP claimed
US-5059243-A TETRA AZA LIGAND SYSTEMS AS COMPLEXING AGENTS FOR ELECTROLESS DEPOSITION OF COPPER INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 1991-10-22 US claimed
CN-1050935-A The light reactive resin composition that can in semi-aqueous, develop DU PONT (US) 1991-04-24 CN claimed
WO-1990000579-A1 STRIPPING COMPOSITION USING N-CYCLOHEXYL-2-PYRROLIDONE ADVANCED CHEMICAL SYSTEMS INTERNATIONAL CORPORATION (US) 1990-01-25 WO claimed
US-4889942-A Process for synthesis of acylamino organosilicon compounds DOW CORNING CORPORATION (US) 1989-12-26 US claimed
EP-0268982-A2 Cosmetic compositions containing microemulsions of dimethylpolysiloxane Toray Silicone Company, Ltd. (JP) 1988-06-01 EP claimed
EP-0042659-B1 5,6,6A,7-TETRAHYDRO-4H-DIBENZ(DE,G)ISOQUINOLINE DERIVATIVES, PROCESS FOR THEIR PREPARATION AND PHARMACEUTICAL COMPOSITIONS CONTAINING THEM GÖDECKE AKTIENGESELLSCHAFT (DE) 1984-08-29 EP claimed
EP-0000658-B1 PROCESS FOR PREPARING ETHYLENICALLY UNSATURATED ISOCYANURATES ICI AMERICAS INC. (US) 1981-09-02 EP claimed