Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 4/20 | 0.32 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL59886 | 0.84 | — | — | |
| SCHEMBL447369 | 0.83 | HSD11B1 (0.31) | HSD11B1MEN1KMT2A | |
| SCHEMBL503907 | 0.81 | APP (0.32) | — | |
| SCHEMBL20162191 | 0.80 | ALDH1A1 (0.36) | MEN1KMT2A | |
| Lithium Ion SCHEMBL1458084 | 0.80 | ALDH1A1 (0.36) | MEN1KMT2A | |
| Potassium Ion SCHEMBL1305480 | 0.80 | ALDH1A1 (0.36) | MEN1KMT2A | |
| SCHEMBL906300 | 0.80 | ALDH1A1 (0.36) | MEN1KMT2A | |
| Silver SCHEMBL219594 | 0.80 | ALDH1A1 (0.36) | MEN1KMT2A | |
| SCHEMBL1401234 | 0.80 | ALDH1A1 (0.36) | MEN1KMT2A | |
| SCHEMBL1305795 | 0.80 | ALDH1A1 (0.36) | MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8435718-B2 | Upper layer-forming composition and photoresist patterning method | JSR CORPORATION (JP) | 2013-05-07 | — | — | US | disclosed |
| EP-1950610-B1 | IMMERSION LITHOGRAPHIC COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR CORP (JP) | 2012-05-02 | — | — | EP | disclosed |
| US-20120028198-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2012-02-02 | — | — | US | disclosed |
| US-20100003615-A1 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD | JSR CORPORATION (JP) | 2010-01-07 | — | — | US | disclosed |
| EP-1950610-A1 | COMPOSITION FOR FORMING UPPER FILM AND METHOD FOR FORMING PHOTORESIST PATTERN | JSR Corporation (JP) | 2008-07-30 | — | — | EP | disclosed |