⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7711433 | 0.90 | — | — | |
| SCHEMBL503597 | 0.84 | HSD11B1 (0.32) | — | |
| SCHEMBL4852337 | 0.83 | — | — | |
| Potassium Ion SCHEMBL1305480 | 0.81 | ALDH1A1 (0.36) | — | |
| SCHEMBL447369 | 0.81 | HSD11B1 (0.31) | — | |
| SCHEMBL447472 | 0.79 | ACHE (0.35) | — | |
| Lithium Ion SCHEMBL1458084 | 0.78 | ALDH1A1 (0.36) | — | |
| SCHEMBL906300 | 0.78 | ALDH1A1 (0.36) | — | |
| SCHEMBL20162191 | 0.78 | ALDH1A1 (0.36) | — | |
| Silver SCHEMBL219594 | 0.78 | ALDH1A1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8759415-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-06-24 | — | — | US | claimed |
| US-20120291668-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-11-22 | — | — | US | claimed |
| US-8262961-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-09-11 | — | — | US | claimed |
| US-8128832-B2 | Processes and materials for step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2012-03-06 | — | — | US | claimed |
| US-20080174051-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-24 | — | — | US | claimed |
| US-20080169268-A1 | PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2008-07-17 | — | — | US | claimed |
| EP-1938149-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | International Business Machines Corporation (US) | 2008-07-02 | — | — | EP | claimed |
| US-7358029-B2 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2008-04-15 | — | — | US | claimed |
| US-20070298176-A1 | AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY | GLOBALFOUNDRIES INC. (KY) | 2007-12-27 | — | — | US | claimed |
| US-20070231734-A1 | Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution | GLOBALFOUNDRIES U.S. INC. | 2007-10-04 | — | — | US | claimed |
| WO-2007039346-A2 | LOW ACTIVATION ENERGY DISSOLUTION MODIFICATION AGENTS FOR PHOTORESIST APPLICATIONS | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2007-04-12 | — | — | WO | claimed |
| US-20070051697-A1 | Processes and materials for step and flash imprint lithography | GLOBALFOUNDRIES INC. (KY) | 2007-03-08 | — | — | US | claimed |
| US-6344305-B1 | AMPLIFIED SILICON-CONTAINING NEGATIVE-TONE RESIST COMPOSITION OF AQUEOUS BASE SOLUBLE SILICON-CONTAINING POLYMER HAVING PHENOLIC GROUP FOR O-ALKYLATION; ACID CATALYZABLE CROSSLINKING AGENT; ACID GENERATOR; SOLVENT; PHOTOSENSITIZER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2002-02-05 | — | — | US | claimed |
| US-8759415-B2 | Aromatic vinyl ether based reverse-tone step and flash imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-06-24 | — | — | US | disclosed |
| US-8734904-B2 | Methods of forming topographical features using segregating polymer mixtures | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-05-27 | — | — | US | disclosed |
| US-8617786-B2 | Poly-oxycarbosilane compositions for use in imprint lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2013-12-31 | — | — | US | disclosed |
| WO-2000010056-A9 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY CO LLC (US) | 2000-06-08 | — | — | WO | disclosed |
| WO-2000010056-A1 | PHOTOACID GENERATORS AND PHOTORESISTS COMPRISING SAME | SHIPLEY COMPANY, L.L.C. (US) | 2000-02-24 | — | — | WO | disclosed |
| US-5998099-A | Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-12-07 | — | — | US | disclosed |
| EP-0907109-A1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-04-07 | — | — | EP | disclosed |