Silver

Silver

SCHEMBL219594

CC12CCC(C(S(=O)(=O)[O-])C1=O)C2(C)C.[Ag+]

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

folP

The experimentally established mechanism targets of Silver. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
HSD17B10 Q99714 1/20 0.36
MEN1 O00255 1/20 0.34
LMNA P02545 1/20 0.34
MAPT P10636 1/20 0.34
KMT2A Q03164 1/20 0.34
CNR2 P34972 2/20 0.33
DPP4 P27487 1/20 0.31
PTPN1 P18031 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1401234 0.97 ALDH1A1 (0.36) ALDH1A1SMN1; SMN2HSD17B10MEN1LMNA
SCHEMBL15065488 0.97 ALDH1A1 (0.36) ALDH1A1SMN1; SMN2HSD17B10MEN1LMNA
SCHEMBL1305795 0.97 ALDH1A1 (0.36) ALDH1A1SMN1; SMN2HSD17B10MEN1LMNA
Lithium Ion SCHEMBL1458084 0.97 ALDH1A1 (0.36) ALDH1A1SMN1; SMN2HSD17B10MEN1LMNA
SCHEMBL20162191 0.97 ALDH1A1 (0.36) ALDH1A1SMN1; SMN2HSD17B10MEN1LMNA
Potassium Ion SCHEMBL1305480 0.97 ALDH1A1 (0.36) ALDH1A1SMN1; SMN2HSD17B10MEN1LMNA
SCHEMBL906300 0.97 ALDH1A1 (0.36) ALDH1A1SMN1; SMN2HSD17B10MEN1LMNA
Tetramethylammonium Ion SCHEMBL593540 0.93 ALDH1A1 (0.34) ALDH1A1SMN1; SMN2HSD17B10MEN1LMNA
SCHEMBL6342389 0.93 ALDH1A1 (0.34) ALDH1A1SMN1; SMN2HSD17B10MEN1LMNA
SCHEMBL447369 0.84 HSD11B1 (0.31) ALDH1A1SMN1; SMN2HSD17B10MEN1MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116200187-A Ionic metallic iridium complex and preparation method and application thereof 中国科学院化学研究所 2023-06-02 CN claimed
US-11880134-B2 Salts and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2024-01-23 US disclosed
CN-116283739-A Ionic metal ruthenium complex, preparation method and application thereof 中国科学院化学研究所 2023-06-23 CN disclosed
CN-116200187-A Ionic metallic iridium complex and preparation method and application thereof 中国科学院化学研究所 2023-06-02 CN disclosed
CN-115079517-A Salt and photoresist comprising the same 罗门哈斯电子材料有限责任公司 2022-09-20 CN disclosed
CN-107001828-B Radiation curable compositions 爱克发有限公司 2021-03-09 CN disclosed
US-20190227433-A1 ACID GENERATORS AND PHOTORESISTS COMPRISING SAME ROHM & HAAS ELECT MAT (US) 2019-07-25 US disclosed
US-20190163058-A1 SALTS AND PHOTORESISTS COMPRISING SAME U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2019-05-30 US disclosed
US-10248020-B2 Acid generators and photoresists comprising same ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-04-02 US disclosed
US-20140186767-A1 ACID GENERATORS AND PHOTORESISTS COMPRISING SAME ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2014-07-03 US disclosed
US-8088548-B2 Bottom antireflective coating compositions AZ ELECTRONIC MATERIALS USA CORP. (US) 2012-01-03 US disclosed
EP-2212273-A2 BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AZ Electronic Materials USA Corp. (US) 2010-08-04 EP disclosed
WO-2009053832-A2 BOTTOM ANTIREFLECTIVE COATING COMPOSITIONS AZ ELECTRONIC MATERIALS USA CORP. (DE) 2009-04-30 WO disclosed
US-20090104559-A1 Bottom Antireflective Coating Compositions MERCK PATENT GMBH (DE) 2009-04-23 US disclosed
EP-1167349-B1 Chemical amplifying type positive resist composition SUMITOMO CHEMICAL CO (JP) 2004-12-01 EP disclosed
US-6548220-B2 Containing acid generator SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2003-04-15 US disclosed
US-20020015913-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-02-07 US disclosed
EP-1167349-A1 Chemical amplifying type positive resist composition and sulfonium salt SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2002-01-02 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090104559-A1 Bottom Antireflective Coating Compositions SDC2, S100A9, MYH9 ALDH1A1 3154/4885SMN1; SMN2 579/4885HSD17B10 4444/4885
US-20190163058-A1 SALTS AND PHOTORESISTS COMPRISING SAME SLC6A6, TST, SLC6A12 ALDH1A1 3514/4885SMN1; SMN2 4651/4885HSD17B10 3548/4885
US-11880134-B2 Salts and photoresists comprising same SLC6A6, TST, XPOT ALDH1A1 3636/4885SMN1; SMN2 4676/4885HSD17B10 3937/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.