Known targets — ChEMBL curated mechanism
ABL1BMXBRAFBTKCHRNA4CHRNB2CSNK1EEGFRERBB2F10FLT1FLT3FLT4IGF1RINSRITKJAK3KDRKITOPRM1PARP1PARP2PDGFRBPIK3CDRAF1RETSLC18A2TECTXKdacAdacBdacCftsImrcAmrcBmrdArplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO
The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RECQL | P46063 | 1/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.41 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | TSHR | P16473 | 2/20 | 0.40 |
| ▸ | NPC1 | O15118 | 1/20 | 0.40 |
| ▸ | RAB9A | P51151 | 1/20 | 0.40 |
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | PKM | P14618 | 1/20 | 0.39 |
| ▸ | LMNA | P02545 | 3/20 | 0.39 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27612829 | 0.90 | SMN1; SMN2 (0.50) | RECQLALDH1A1CYP2D6HSD11B1SMN1; SMN2 | |
| SCHEMBL11057570 | 0.84 | CES1 (0.45) | ALDH1A1TDP1CYP2D6MAPK1HSD11B1 | |
| SCHEMBL499362 | 0.83 | RECQL (0.46) | RECQLALDH1A1TDP1TP53CYP2D6 | |
| SCHEMBL27575142 | 0.81 | RECQL (0.56) | RECQLALDH1A1TDP1TP53CYP2D6 | |
| SCHEMBL36374 | 0.81 | CES1 (0.48) | RECQLALDH1A1TDP1MAPK1MEN1 | |
| Trifluoromethanesulfonic Acid SCHEMBL503620 | 0.79 | CES1 (0.46) | CYP2D6MAPK1HSD11B1NPC1RAB9A | |
| Methoxymethane SCHEMBL36098 | 0.78 | CES1 (0.56) | ALDH1A1TDP1MAPK1MEN1KMT2A | |
| SCHEMBL547325 | 0.77 | RECQL (0.46) | RECQLALDH1A1TDP1TP53CYP2D6 | |
| SCHEMBL11181163 | 0.77 | RECQL (0.43) | RECQLALDH1A1TDP1TP53CYP2D6 | |
| SCHEMBL9575058 | 0.77 | ALDH1A1 (0.42) | RECQLALDH1A1TDP1TP53HSD11B1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 267 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | claimed |
| CN-122043858-A | EUV patterned resist formation method | 亚历克斯·P·G·罗宾逊 | 2026-05-15 | — | — | CN | disclosed |
| WO-2024075641-A1 | POLYMER MATERIAL FOR USE IN DENTISTRY | サンメディカル株式会社 | 2024-04-11 | — | — | WO | disclosed |
| WO-2023243636-A1 | MEMBER PROCESSING METHOD | 日東電工株式会社 | 2023-12-21 | — | — | WO | disclosed |
| WO-2023243634-A1 | TRANSFER SHEET | 日東電工株式会社 | 2023-12-21 | — | — | WO | disclosed |
| WO-2023191112-A1 | DENTAL CURABLE COMPOSITION HAVING FAVORABLE COLOR COMPATIBILITY | クラレノリタケデンタル株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |
| US-20200272050-A1 | Enhanced EUV Photoresist Materials, Formulations and Processes | IRRESISTIBLE MATERIALS, LTD (GB) | 2020-08-27 | — | — | US | disclosed |
| CN-110998437-A | Multi-trigger photoresist compositions and methods | A·P·G·罗宾森 | 2020-04-10 | — | — | CN | disclosed |
| EP-0917000-A2 | Positive resist composition and method for forming a resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-05-19 | — | — | EP | disclosed |
| US-5891601-A | DIPYRIDYL COMPOUND | SUMITOMO CHEMICAL COMPANY, LTD. (JP) | 1999-04-06 | — | — | US | disclosed |
| EP-0901043-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 1999-03-10 | — | — | EP | disclosed |
| EP-0898201-A1 | Radiation sensitive resin composition | JSR Corporation (JP) | 1999-02-24 | — | — | EP | disclosed |
| EP-0843220-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |
| US-5744511-A | BLEND OF COUMARIN DYES, ACID GENERATOR AND ARYL BORATE | TOKUYAMA CORPORATION (JP) | 1998-04-28 | — | — | US | disclosed |
| EP-0837367-A2 | Positive resist composition comprising a dipyridyl compound | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1998-04-22 | — | — | EP | disclosed |
| EP-0837368-A1 | Positive resist composition | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 1998-04-22 | — | — | EP | disclosed |
| EP-0793144-A2 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |
| EP-0738928-A2 | Visible-ray polymerization initiator and visible-ray polymerizable composition | TOKUYAMA CORPORATION (JP) | 1996-10-23 | — | — | EP | disclosed |