Known targets — ChEMBL curated mechanism
AGTR1DHFRGABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTNR3C2PBP2XPTGS1PTGS2VKORC1blablaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAftsImrcAmrcBmrdApbp1apbp1bpbp2apbp2bpbp3polthyA
The experimentally established mechanism targets of Potassium Ion. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.52 |
| ▸ | CA1 | P00915 | 6/20 | 0.36 |
| ▸ | CA2 | P00918 | 6/20 | 0.36 |
| ▸ | MMP1 | P03956 | 2/20 | 0.36 |
| ▸ | MMP2 | P08253 | 2/20 | 0.36 |
| ▸ | MMP9 | P14780 | 2/20 | 0.36 |
| ▸ | MMP8 | P22894 | 2/20 | 0.36 |
| ▸ | MMP13 | P45452 | 2/20 | 0.36 |
| ▸ | CA4 | P22748 | 1/20 | 0.30 |
| ▸ | FAHD1 | Q6P587 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Potassium Ion SCHEMBL5066694 | 0.97 | THRB (0.56) | THRBCA1CA2MMP1MMP2 | |
| Potassium Ion SCHEMBL31098404 | 0.97 | THRB (0.56) | THRBCA1CA2MMP1MMP2 | |
| Potassium Ion SCHEMBL28623858 | 0.97 | THRB (0.56) | THRBCA1CA2MMP1MMP2 | |
| Potassium Ion SCHEMBL2196710 | 0.97 | THRB (0.56) | THRBCA1CA2MMP1MMP2 | |
| Potassium Ion SCHEMBL2234663 | 0.97 | THRB (0.56) | THRBCA1CA2MMP1MMP2 | |
| Potassium Ion SCHEMBL2790789 | 0.97 | THRB (0.56) | THRBCA1CA2MMP1MMP2 | |
| Potassium Ion SCHEMBL1905877 | 0.97 | THRB (0.56) | THRBCA1CA2MMP1MMP2 | |
| Potassium Ion SCHEMBL5066664 | 0.97 | THRB (0.56) | THRBCA1CA2MMP1MMP2 | |
| Potassium Ion SCHEMBL30052398 | 0.97 | THRB (0.56) | THRBCA1CA2MMP1MMP2 | |
| Water SCHEMBL10598858 | 0.95 | THRB (0.54) | THRBCA1CA2MMP1MMP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-117801344-A | High-temperature-resistant low-shrinkage protective film for metal-based printed circuit board and preparation method thereof | 河源昆腾电子科技有限公司 | 2024-04-02 | — | — | CN | disclosed |
| US-7351342-B2 | Method for recovering fluorine-containing emulsifier | ASAHI GLASS COMPANY, LIMITED (JP) | 2008-04-01 | — | — | US | disclosed |
| EP-1514848-B1 | PROCESS FOR THE RECOVERY OF FLUORINE-CONTAINING EMULSIFIERS | SASAKURA ENG CO LTD (JP) | 2006-04-05 | — | — | EP | disclosed |
| US-20050150833-A1 | Method for recovering fluorine-containing emulsifier | ASAHI GLASS COMPANY LIMITED (JP) | 2005-07-14 | — | — | US | disclosed |
| EP-1514848-A1 | PROCESS FOR THE RECOVERY OF FLUORINE-CONTAINING EMULSIFIERS | Sasakura Engineering Co. Ltd. (JP) | 2005-03-16 | — | — | EP | disclosed |
| US-6737133-B2 | THERMOPLASTIC FLUORINE RESIN, BLEND WITH SPECIFIED AMOUNTS OF A POLYAMIDEESTERETHER OR POLYAMIDEETHER AND AN ALKALI METAL HALIDE OR FLUORINE-CONTAINING SURFACTANT; ANTISTATIC | CANON KABUSHIKI KAISHA (JP) | 2004-05-18 | — | — | US | disclosed |
| US-20030098282-A1 | Method for adsorbing and recovering fluorine-containing emulsifier | ASAHI GLASS COMPANY, LIMITED (JP) | 2003-05-29 | — | — | US | disclosed |
| EP-1314700-A1 | Method for absorbing and recovering fluorine-containing emulsifier | ASAHI GLASS COMPANY LTD. (JP) | 2003-05-28 | — | — | EP | disclosed |
| US-20020061378-A1 | Electrophotographic seamless belt, and electrophotographic apparatus having the electrophotographic seamlessbelt | CANON KABUSHIKI KAISHA (JP) | 2002-05-23 | — | — | US | disclosed |
| US-6296916-B1 | ANTISTATIC HARD COATINGS, LOW CURING SHRINKAGE, LOW VISCOSITY | MITSUBISHI RAYON CO., LTD. (JP) | 2001-10-02 | — | — | US | disclosed |
| US-6066684-A | A PHOTOPOLYMERIZABLE MONOMER COMPRISING A MIXTURE OF (METH)ACRYLIC ACID ESTER MONOMER CONTAINING 2, 1, OR ONE ESTER GROUPS WITH HYDROXY AND ATLEAST AN ESTER HAVING NOHYDROXY GROUP AND PERFLUOROCARBOXYLIC OR SULFONIC METAL SALT | MITSUBISHI RAYON CO., LTD. (JP) | 2000-05-23 | — | — | US | disclosed |
| US-4434273-A | MOLDING MATERIALS, ION EXCHANGE RESINS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1984-02-28 | — | — | US | disclosed |
| US-4385187-A | ION EXCHANGE RESINS,MOLDING MATERIALS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1983-05-24 | — | — | US | disclosed |