SCHEMBL5078808

SCHEMBL5078808

FC(F)(F)c1ccoc1C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
NOTUM Q6P988 1/20 0.31
GLA P06280 1/20 0.30
POLB P06746 1/20 0.30
GAA P10253 1/20 0.30
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3699984 0.72 NOTUM (0.33) NOTUM
SCHEMBL19718161 0.72 SMN1; SMN2 (0.38) GAATSHR
SCHEMBL13295560 0.72
SCHEMBL18049526 0.72 NOS3 (0.31)
SCHEMBL23607086 0.67 P2RX7 (0.32) GAA
SCHEMBL22893863 0.67 LOXL2 (0.33)
SCHEMBL9625067 0.66 KDM4E (0.50)
SCHEMBL18094477 0.64 CFTR (0.35) GAA
SCHEMBL3633653 0.64 SMN1; SMN2 (0.38) POLBGAATSHR
SCHEMBL1106089 0.63 CA2 (0.33) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11005126-B2 Electrolytic solution for secondary battery, secondary battery, battery pack, electric vehicle, electric power storage system, electric power tool, and electronic device MURATA MANUFACTURING CO., LTD. (JP) 2021-05-11 US disclosed
US-20190207257-A1 ELECTROLYTIC SOLUTION FOR SECONDARY BATTERY, SECONDARY BATTERY, BATTERY PACK, ELECTRIC VEHICLE, ELECTRIC POWER STORAGE SYSTEM, ELECTRIC POWER TOOL, AND ELECTRONIC DEVICE EnviroMix, Inc. 2019-07-04 US disclosed
US-20080274334-A1 Dry Etching Gas and Method of Dry Etching NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) 2008-11-06 US disclosed
EP-1760769-A1 DRY ETCHING GASES AND METHOD OF DRY ETCHING National Institute of Advanced Industrial Science and Technology (JP) 2007-03-07 EP disclosed