Known targets — ChEMBL curated mechanism
ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 2/20 | 0.40 |
| ▸ | CA2 | P00918 | 2/20 | 0.40 |
| ▸ | CA7 | P43166 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
| ▸ | IDO1 | P14902 | 1/20 | 0.35 |
| ▸ | ORAI1 | Q96D31 | 1/20 | 0.35 |
| ▸ | ORAI2 | Q96SN7 | 1/20 | 0.35 |
| ▸ | ORAI3 | Q9BRQ5 | 1/20 | 0.35 |
| ▸ | TRPV6 | Q9H1D0 | 1/20 | 0.35 |
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.35 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.35 |
| ▸ | NOS3 | P29474 | 2/20 | 0.35 |
| ▸ | NOS1 | P29475 | 2/20 | 0.35 |
| ▸ | NPC1 | O15118 | 2/20 | 0.33 |
| ▸ | RAB9A | P51151 | 2/20 | 0.33 |
| ▸ | NFE2L2 | Q16236 | 2/20 | 0.32 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.32 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL686201 | 0.97 | CA1 (0.42) | CA1CA2CA7CA9ACHE | |
| Hydrochloric Acid SCHEMBL31079480 | 0.93 | CA1 (0.40) | CA1CA2CA7CA9ACHE | |
| Bromide SCHEMBL3139897 | 0.89 | NFE2L2 (0.42) | CA1CA2CA7CA9ACHE | |
| Bromide SCHEMBL3139600 | 0.89 | NFE2L2 (0.42) | CA1CA2CA7CA9ACHE | |
| SCHEMBL11980109 | 0.85 | NFE2L2 (0.44) | CA1CA2CA7CA9ACHE | |
| SCHEMBL685318 | 0.85 | NFE2L2 (0.44) | CA1CA2CA7CA9ACHE | |
| SCHEMBL686199 | 0.85 | NFE2L2 (0.44) | CA1CA2CA7CA9ACHE | |
| SCHEMBL6117392 | 0.83 | GAA (0.45) | CA1CA2CA9ORAI1ORAI2 | |
| SCHEMBL3287720 | 0.83 | CA1 (0.33) | CA1CA2CA7CA9ACHE | |
| SCHEMBL6116896 | 0.83 | ACHE (0.68) | ACHENOS3NOS1NFE2L2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2026101739-A1 | CYCLIC SULFONATE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC (US) | 2026-05-15 | — | — | WO | disclosed |
| US-12554196-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound | FUJIFILM CORPORATION (JP) | 2026-02-17 | — | — | US | disclosed |
| US-20250334880-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | JSR CORPORATION (JP) | 2025-10-30 | — | — | US | disclosed |
| WO-2025038912-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC (US) | 2025-02-20 | — | — | WO | disclosed |
| WO-2025038907-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC (US) | 2025-02-20 | — | — | WO | disclosed |
| US-20240345480-A1 | MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-10-17 | — | — | US | disclosed |
| WO-2024150553-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND COMPOUND | JSR株式会社 | 2024-07-18 | — | — | WO | disclosed |
| WO-2024090041-A1 | RADIOACTIVE-RAY-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2024-05-02 | — | — | WO | disclosed |
| US-20230148344-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND | FUJIFILM CORPORATION (JP) | 2023-05-11 | — | — | US | disclosed |
| EP-4159716-A1 | ACTINIC-RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, RESIST FILM, ELECTRONIC DEVICE MANUFACTURING METHOD, COMPOUND, AND COMPOUND PRODUCTION METHOD | FUJIFILM Corporation (JP) | 2023-04-05 | — | — | EP | disclosed |
| US-7285369-B2 | photoresist composition comprising resins that increases solubility in alkali developing solution by the action of an acid and photoacid generators, which exhibits high sensitivity, high resolution and stability | FUJIFILM CORPORATION (JP) | 2007-10-23 | — | — | US | disclosed |
| EP-1519228-A2 | Positive resist composition and pattern formation method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2005-03-30 | — | — | EP | disclosed |
| US-20050064329-A1 | Positive resist composition and pattern formation method using the same | FUJI PHOTO FILM CO., LTD. | 2005-03-24 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12554196-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, method for manufacturing electronic device, compound, and method for producing compound | RER1, RAD51, GLRA1 | ACHE 4753/4885CA1 3488/4885CA2 4520/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.