Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 2/20 | 0.42 |
| ▸ | CA2 | P00918 | 2/20 | 0.42 |
| ▸ | CA7 | P43166 | 1/20 | 0.42 |
| ▸ | CA9 | Q16790 | 1/20 | 0.42 |
| ▸ | ACHE | P22303 | 1/20 | 0.42 |
| ▸ | IDO1 | P14902 | 1/20 | 0.36 |
| ▸ | ORAI1 | Q96D31 | 1/20 | 0.36 |
| ▸ | ORAI2 | Q96SN7 | 1/20 | 0.36 |
| ▸ | ORAI3 | Q9BRQ5 | 1/20 | 0.36 |
| ▸ | TRPV6 | Q9H1D0 | 1/20 | 0.36 |
| ▸ | CES2 | O00748 | 1/20 | 0.36 |
| ▸ | CES1 | P23141 | 1/20 | 0.36 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.36 |
| ▸ | NOS3 | P29474 | 2/20 | 0.36 |
| ▸ | NOS1 | P29475 | 2/20 | 0.36 |
| ▸ | NPC1 | O15118 | 2/20 | 0.35 |
| ▸ | RAB9A | P51151 | 2/20 | 0.35 |
| ▸ | NFE2L2 | Q16236 | 2/20 | 0.33 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.33 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL31079480 | 0.97 | CA1 (0.40) | CA1CA2CA7CA9ACHE | |
| Bromide SCHEMBL5146908 | 0.97 | CA1 (0.40) | CA1CA2CA7CA9ACHE | |
| SCHEMBL11980109 | 0.88 | NFE2L2 (0.44) | CA1CA2CA7CA9ACHE | |
| SCHEMBL685318 | 0.88 | NFE2L2 (0.44) | CA1CA2CA7CA9ACHE | |
| SCHEMBL686199 | 0.88 | NFE2L2 (0.44) | CA1CA2CA7CA9ACHE | |
| SCHEMBL6117392 | 0.86 | GAA (0.45) | CA1CA2CA9ORAI1ORAI2 | |
| SCHEMBL3287720 | 0.86 | CA1 (0.33) | CA1CA2CA7CA9ACHE | |
| Bromide SCHEMBL3139897 | 0.86 | NFE2L2 (0.42) | CA1CA2CA7CA9ACHE | |
| SCHEMBL6116896 | 0.86 | ACHE (0.68) | ACHENOS3NOS1NFE2L2 | |
| SCHEMBL4591904 | 0.86 | NPC1 (0.43) | CA1CA2CA7CA9NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 952 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2455811-B1 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | SHINETSU CHEMICAL CO (JP) | 2016-01-13 | — | — | EP | claimed |
| EP-2455811-A1 | Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method | Shin-Etsu Chemical Co., Ltd. (JP) | 2012-05-23 | — | — | EP | claimed |
| EP-4748893-A1 | PHOTOCURABLE RESIN COMPOSITION, ADHESIVE, SEALING MATERIAL, COATING AGENT, CURED PRODUCT, SEMICONDUCTOR DEVICE, ELECTRONIC COMPONENT, AND CURING, BONDING, SEALING, AND COATING METHODS USING PHOTOCURABLE RESIN COMPOSITION | Namics Corporation (JP) | 2026-05-27 | — | — | EP | disclosed |
| US-20260116071-A1 | METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD | CANON KK (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4722811-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-4722814-A1 | PATTERN FORMING METHOD AND PROCESSING LIQUID FOR METAL COMPOUND-CONTAINING FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-4722810-A1 | RESIST MATERIAL, PATTERN FORMING METHOD, AND PATTERNED STRUCTURE | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-4696511-A1 | INK-JET RECORDING HEAD | Canon Kabushiki Kaisha (JP) | 2026-02-18 | — | — | EP | disclosed |
| US-20260042917-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20260042294-A1 | INK-JET RECORDING HEAD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20260042918-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | CANON KK (JP) | 2026-02-12 | — | — | US | disclosed |
| US-20070166643-A1 | Photosensitive resin composition and manufacturing method of semiconductor device using the same | FUJIFILM CORPORATION (JP) | 2007-07-19 | — | — | US | disclosed |
| US-20070160815-A1 | Ink composition, inkjet recording method, printed material, process for producing lithographic printing plate, and lithographic printing plate | FUJIFILM CORPORATION (JP) | 2007-07-12 | — | — | US | disclosed |
| EP-1752463-A1 | NOVEL FLUORINATED ALKYLFLUOROPHOSPHORIC ACID SALT OF ONIUM AND TRANSITION METAL COMPLEX | San-Apro Limited (JP) | 2007-02-14 | — | — | EP | disclosed |
| US-20050016402-A1 | Lithographic process involving on press development | FUJI PHOTO FILM CO., LTD. | 2005-01-27 | — | — | US | disclosed |
| EP-1484177-A2 | Lithographic process involving on press development | FUJI PHOTO FILM CO., LTD. (JP) | 2004-12-08 | — | — | EP | disclosed |
| EP-0375160-B1 | Tethered sulfonium salt photoinitiators for free radical polymerization | MINNESOTA MINING & MFG (US) | 1995-03-08 | — | — | EP | disclosed |
| US-4954416-A | PHOTOSENSITIZED COORDINATION COMPOUNDS; SYNERGISTIC; PHOTORESISTS; PROTECTIVE COATINGS; PRINTING PLATES; GRAPHIC ARTS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-09-04 | — | — | US | disclosed |
| EP-0375160-A2 | Tethered sulfonium salt photoinitiators for free radical polymerization | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-06-27 | — | — | EP | disclosed |
| EP-0292821-A2 | Image reversal process for normally positive photoresists | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-11-30 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260042917-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | MLLT3, OR10J3, RFT1 | CA1 616/4885CA2 1279/4885CA7 683/4885 |
| US-20260116071-A1 | METHOD OF MANUFACTURING LIQUID EJECTION HEAD, AND LIQUID EJECTION HEAD | ASIC1, PTGER1, PELP1 | CA1 254/4885CA2 1901/4885CA7 2027/4885 |
| US-20260042294-A1 | INK-JET RECORDING HEAD | SEM1, ASIC1, C9 | CA1 13/4885CA2 922/4885CA7 128/4885 |
| US-20260042918-A1 | PHOTOSENSITIVE RESIN COMPOSITION, LIQUID-REPELLENT ANTI-FOULING FILM, AND INKJET RECORDING HEAD | MLLT1, MLLT3, ERCC1 | CA1 438/4885CA2 1032/4885CA7 743/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.