Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 1/20 | 0.41 |
| ▸ | HSD11B1 | P28845 | 3/20 | 0.38 |
| ▸ | DPP8 | Q6V1X1 | 1/20 | 0.37 |
| ▸ | DPP9 | Q86TI2 | 1/20 | 0.37 |
| ▸ | DPP4 | P27487 | 1/20 | 0.36 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.33 |
| ▸ | MEN1 | O00255 | 1/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.33 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5614350 | 0.90 | DPP8 (0.41) | PKMHSD11B1DPP8DPP9DPP4 | |
| SCHEMBL5917754 | 0.87 | PKM (0.42) | PKMHSD11B1DPP4NPSR1ALDH1A1 | |
| SCHEMBL13613924 | 0.85 | PKM (0.41) | PKMHSD11B1DPP8DPP9DPP4 | |
| SCHEMBL22991690 | 0.81 | PKM (0.41) | PKMHSD11B1DPP4NPSR1ALDH1A1 | |
| SCHEMBL13998863 | 0.79 | PKM (0.42) | PKMHSD11B1DPP8DPP9DPP4 | |
| SCHEMBL10228455 | 0.79 | PKM (0.39) | PKMHSD11B1DPP4ALDH1A1EPHX2 | |
| SCHEMBL482480 | 0.78 | ALDH1A1 (0.41) | NPSR1LMNAALDH1A1MEN1HTT | |
| SCHEMBL514808 | 0.77 | PKM (0.38) | PKMHSD11B1DPP4ALDH1A1 | |
| SCHEMBL17792424 | 0.77 | PKM (0.33) | PKMDPP4EPHX2 | |
| SCHEMBL14141112 | 0.76 | PKM (0.47) | PKMHSD11B1DPP4NPSR1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8900791-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition | FUJIFILM CORPORATION (JP) | 2014-12-02 | — | — | US | disclosed |
| US-8900791-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and method of forming pattern with the composition | FUJIFILM CORPORATION (JP) | 2014-12-02 | — | — | US | disclosed |
| US-20120003585-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20120003585-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-05 | — | — | US | disclosed |
| US-20110171577-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-14 | — | — | US | disclosed |
| US-20110171577-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-07-14 | — | — | US | disclosed |
| US-7612217-B2 | Sulfonium compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-11-03 | — | — | US | disclosed |
| US-7612217-B2 | Sulfonium compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2009-11-03 | — | — | US | disclosed |
| US-7439006-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-10-21 | — | — | US | disclosed |
| US-7439006-B2 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-10-21 | — | — | US | disclosed |
| US-20080081925-A1 | Sulfonium compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080081925-A1 | Sulfonium compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-04-03 | — | — | US | disclosed |
| US-20080076063-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-03-27 | — | — | US | disclosed |
| US-20080076063-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2008-03-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20080081925-A1 | Sulfonium compound | SLCO2A1, AFF2, SLCO2B1 | PKM 3909/4885HSD11B1 1240/4885DPP8 4693/4885 |
| US-20080076063-A1 | Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same | SLC26A3, HCN3, NHERF1 | PKM 3950/4885HSD11B1 370/4885DPP8 4882/4885 |
| US-20110171577-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN WITH THE COMPOSITION | ARSA, RAD51, ARID2 | PKM 4803/4885HSD11B1 3263/4885DPP8 4881/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.