Known targets — ChEMBL curated mechanism
ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SIGMAR1 | Q99720 | 6/20 | 0.54 |
| ▸ | TAAR1 | Q96RJ0 | 5/20 | 0.54 |
| ▸ | SLC6A2 | P23975 | 3/20 | 0.54 |
| ▸ | SLC6A4 | P31645 | 2/20 | 0.54 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.54 |
| ▸ | MAOA | P21397 | 1/20 | 0.54 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.54 |
| ▸ | ADORA2A | P29274 | 1/20 | 0.54 |
| ▸ | ADORA1 | P30542 | 1/20 | 0.54 |
| ▸ | SLC18A2 | Q05940 | 1/20 | 0.50 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.50 |
| ▸ | TRPA1 | O75762 | 2/20 | 0.48 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.45 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.45 |
| ▸ | HTR2A | P28223 | 1/20 | 0.45 |
| ▸ | ADRA1A | P35348 | 1/20 | 0.45 |
| ▸ | OPRK1 | P41145 | 1/20 | 0.45 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.45 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL28038138 | 0.95 | SIGMAR1 (0.50) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| Iodide SCHEMBL931546 | 0.94 | SIGMAR1 (0.54) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| Water SCHEMBL2496495 | 0.94 | SIGMAR1 (0.54) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| Fluoride Ion SCHEMBL28882550 | 0.94 | SIGMAR1 (0.54) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| Hydrochloric Acid SCHEMBL516365 | 0.94 | SIGMAR1 (0.54) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL9752209 | 0.94 | SIGMAR1 (0.54) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| Fluoride Ion SCHEMBL4615583 | 0.94 | SIGMAR1 (0.54) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| Fluoride Ion SCHEMBL64308 | 0.92 | SIGMAR1 (0.52) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL7179621 | 0.87 | SIGMAR1 (0.48) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 | |
| SCHEMBL7175865 | 0.87 | SIGMAR1 (0.48) | SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 194 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3901189-B1 | STABLE DISPERSANT AND APPLICATION THEREOF IN PREPARING COPOLYMER POLYOLS | WANHUA CHEMICAL GROUP CO LTD (CN) | 2025-06-25 | — | — | EP | claimed |
| EP-3904416-B1 | MACROMONOMERIC STABILIZER, PREPARATION METHOD THEREOF, AND METHOD FOR PREPARING POLYMERIC POLYOL | WANHUA CHEMICAL GROUP CO LTD (CN) | 2023-04-19 | — | — | EP | claimed |
| EP-3904416-A1 | MACROMONOMERIC STABILIZER, PREPARATION METHOD THEREOF, AND METHOD FOR PREPARING POLYMERIC POLYOL | Wanhua Chemical Group Co., Ltd. (CN) | 2021-11-03 | — | — | EP | claimed |
| CN-109836538-B | Polymer polyol and method for producing the same | 万华化学集团股份有限公司 | 2021-07-23 | — | — | CN | claimed |
| CN-108339569-B | Supported quaternary phosphonium salt non-metallic catalyst, preparation method and application | 天津大学 | 2020-07-28 | — | — | CN | claimed |
| EP-4644358-A1 | PROCESS TO OBTAIN METHYL (E)-2-[2-(HALOMETHYL)-3-METHYL-PHENYL]-3-METHOXY-PROP-2-ENOATES AND INTERMEDIATES THEREOF | BASF SE (DE) | 2025-11-05 | — | — | EP | disclosed |
| EP-4428192-B1 | RESIN COMPOSITION | AJINOMOTO KK (JP) | 2025-10-29 | — | — | EP | disclosed |
| US-20250326886-A1 | POLYMER COMPOSITION, EPOXY RESIN COMPOSITION, CURING AGENT FOR EPOXY RESIN, AND FAST CURING ADHESIVE | TORAY FINE CHEMICALS CO., LTD. (JP) | 2025-10-23 | — | — | US | disclosed |
| CN-120077030-A | Ester compound, ester compound composition for resin raw material | 本州化学工业株式会社 | 2025-05-30 | — | — | CN | disclosed |
| CN-120051502-A | Chain-linking agent, curable resin composition, cured product thereof, chain-linking method, and epoxy resin | 本州化学工业株式会社 | 2025-05-27 | — | — | CN | disclosed |
| US-20250034415-A1 | ACTIVE ENERGY RAY CURABLE INKJET INK, METHOD FOR PRODUCING INKJET INK, INKJET RECORDING METHOD, AND INKJET RECORDING SYSTEM | Konica Minolta, Inc. (JP) | 2025-01-30 | — | — | US | disclosed |
| US-20250034397-A1 | PIGMENT DISPERSION COMPOSITION, DISPERSION COMPOSITION, ACTIVE ENERGY RAY CURABLE INK COMPOSITION, PRINTING METHOD, AND PRINTING SYSTEM | Konica Minolta, Inc. (JP) | 2025-01-30 | — | — | US | disclosed |
| WO-1994024335-A1 | METHOD FOR PREPARING ORGANIC AND INORGANIC HYDROXIDES AND ALKOXIDES BY ELECTROLYSIS | SACHEM, INC. (US) | 1994-10-27 | — | — | WO | disclosed |
| US-5286354-A | With reducing agent in acidic anolyte to prevent accumulation of halogen | SACHEM, INC. (US) | 1994-02-15 | — | — | US | disclosed |
| EP-0337322-B1 | PROCESS FOR PRODUCING MONOSILANE | MITSUBISHI KASEI CORPORATION (JP) | 1993-07-21 | — | — | EP | disclosed |
| US-5179221-A | METHOD FOR PRODUCTION OF 3-CYANO-3,5,5-TRIMETHYL CYCLOHEXANONE | NIPPON CHEMICALS CO., LTD. (JP) | 1993-01-12 | — | — | US | disclosed |
| EP-0502707-A1 | Method for production of 3-cyano-3,5,5-trimethyl cyclohexanone | NIPPOH CHEMICALS CO., LTD. (JP) | 1992-09-09 | — | — | EP | disclosed |
| US-4904460-A | Process for producing monosilane | MITSUBISHI KASEI CORPORATION (JP) | 1990-02-27 | — | — | US | disclosed |
| EP-0337322-A2 | Process for producing monosilane | MITSUBISHI KASEI CORPORATION (JP) | 1989-10-18 | — | — | EP | disclosed |
| US-4122067-A | Process of reacting a polyepoxide compound with a phenol in aqueous medium | CELANESE POLYMER SPECIALTIES COMPANY (US) | 1978-10-24 | — | — | US | disclosed |