Water

Water

SCHEMBL2496495

C[P+](C)(C)Cc1ccccc1.[OH-]

nearest known ligand 0.59

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 6/20 0.54
TAAR1 Q96RJ0 5/20 0.54
SLC6A2 P23975 3/20 0.54
SLC6A4 P31645 2/20 0.54
SLC6A3 Q01959 2/20 0.54
MAOA P21397 1/20 0.54
CYP2A6 P11509 1/20 0.54
ADORA2A P29274 1/20 0.54
ADORA1 P30542 1/20 0.54
SLC18A2 Q05940 1/20 0.50
CYP2D6 P10635 1/20 0.50
TRPA1 O75762 2/20 0.48
EPHX1 P07099 1/20 0.46
TP53 P04637 1/20 0.46
ADRA2B P18089 1/20 0.45
ADRA2C P18825 1/20 0.45
HTR2A P28223 1/20 0.45
ADRA1A P35348 1/20 0.45
OPRK1 P41145 1/20 0.45
KCNH2 Q12809 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride Ion SCHEMBL28882550 0.94 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL9752209 0.94 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Iodide SCHEMBL931546 0.94 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Bromide SCHEMBL515994 0.94 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Fluoride Ion SCHEMBL4615583 0.94 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Hydrochloric Acid SCHEMBL516365 0.94 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Fluoride Ion SCHEMBL64308 0.92 SIGMAR1 (0.52) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Bromide SCHEMBL28038138 0.90 SIGMAR1 (0.50) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL2870339 0.87 SIGMAR1 (0.48) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL7175865 0.87 SIGMAR1 (0.48) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 174 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3904416-B1 MACROMONOMERIC STABILIZER, PREPARATION METHOD THEREOF, AND METHOD FOR PREPARING POLYMERIC POLYOL WANHUA CHEMICAL GROUP CO LTD (CN) 2023-04-19 EP claimed
EP-3904416-A1 MACROMONOMERIC STABILIZER, PREPARATION METHOD THEREOF, AND METHOD FOR PREPARING POLYMERIC POLYOL Wanhua Chemical Group Co., Ltd. (CN) 2021-11-03 EP claimed
US-10246791-B2 Electrodeposition mediums for formation of protective coatings electrochemically deposited on metal substrates GENERAL CABLE TECHNOLOGIES CORPORATION (US) 2019-04-02 US claimed
EP-3197612-A1 ELECTRODEPOSITION MEDIUMS FOR FORMATION OF PROTECTIVE COATINGS ELECTROCHEMICALLY DEPOSITED ON METAL SUBSTRATES General Cable Technologies Corporation (US) 2017-08-02 EP claimed
US-20160083862-A1 ELECTRODEPOSITION MEDIUMS FOR FORMATION OF PROTECTIVE COATINGS ELECTROCHEMICALLY DEPOSITED ON METAL SUBSTRATES GENERAL CABLE TECHNOLOGIES CORPORATION 2016-03-24 US claimed
US-20250326886-A1 POLYMER COMPOSITION, EPOXY RESIN COMPOSITION, CURING AGENT FOR EPOXY RESIN, AND FAST CURING ADHESIVE TORAY FINE CHEMICALS CO., LTD. (JP) 2025-10-23 US disclosed
US-12012658-B2 Composition, kit, and method for treating substrate FUJIFILM CORPORATION (JP) 2024-06-18 US disclosed
CN-117355557-A Polymer composition, epoxy resin composition, curing agent for epoxy resin, and quick-setting adhesive 东丽精细化工株式会社 2024-01-05 CN disclosed
US-11795265-B2 Macromonomeric stabilizer, preparation method thereof, and method for preparing polymeric polyol WANHUA CHEMICAL GROUP CO., LTD. (CN) 2023-10-24 US disclosed
EP-3904416-B1 MACROMONOMERIC STABILIZER, PREPARATION METHOD THEREOF, AND METHOD FOR PREPARING POLYMERIC POLYOL WANHUA CHEMICAL GROUP CO LTD (CN) 2023-04-19 EP disclosed
WO-2023276585-A1 METHOD FOR PRODUCING COMPOSITE PARTICLE, AND COMPOSITE PARTICLE 凸版印刷株式会社 2023-01-05 WO disclosed
WO-2022249966-A1 POLYMER COMPOSITION, EPOXY RESIN COMPOSITION, CURING AGENT FOR EPOXY RESIN, AND FAST-CURING ADHESIVE 東レ・ファインケミカル株式会社 2022-12-01 WO disclosed
US-5389211-A Method for producing high purity hydroxides and alkoxides SACHEM, INC. (US) 1995-02-14 US disclosed
EP-0337322-B1 PROCESS FOR PRODUCING MONOSILANE MITSUBISHI KASEI CORPORATION (JP) 1993-07-21 EP disclosed
US-4904460-A Process for producing monosilane MITSUBISHI KASEI CORPORATION (JP) 1990-02-27 US disclosed
EP-0337322-A2 Process for producing monosilane MITSUBISHI KASEI CORPORATION (JP) 1989-10-18 EP disclosed
EP-0002734-B1 PROCESS FOR THE PREPARATION OF PIPERONYLIDENECROTON AMIDES HAARMANN & REIMER GMBH (DE) 1980-09-17 EP disclosed
US-4209445-A FROM PIPERONAL AND A CROTONIC AMIDE IN PRESENCE OF QUATERNARY AMMONIUM OR PHOSPHONIUM HYDROXIDE OR CROWN ETHER METAL COMPLEX HAARMAN & REIMER GMBH (DE) 1980-06-24 US disclosed
US-4206067-A Thermally stabilized erosion-inhibited functional fluids containing perhalometal compounds and an organic base CHEVRON RESEARCH COMPANY (US) 1980-06-03 US disclosed
EP-0002734-A2 Process for the preparation of piperonylidenecroton amides HAARMANN & REIMER GMBH (DE) 1979-07-11 EP disclosed