Iodide

Iodide

SCHEMBL931546

C[P+](C)(C)Cc1ccccc1.[I-]

nearest known ligand 0.59

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SIGMAR1 Q99720 6/20 0.54
TAAR1 Q96RJ0 5/20 0.54
SLC6A2 P23975 3/20 0.54
SLC6A4 P31645 2/20 0.54
SLC6A3 Q01959 2/20 0.54
MAOA P21397 1/20 0.54
CYP2A6 P11509 1/20 0.54
ADORA2A P29274 1/20 0.54
ADORA1 P30542 1/20 0.54
SLC18A2 Q05940 1/20 0.50
CYP2D6 P10635 1/20 0.50
TRPA1 O75762 2/20 0.48
EPHX1 P07099 1/20 0.46
TP53 P04637 1/20 0.46
ADRA2B P18089 1/20 0.45
ADRA2C P18825 1/20 0.45
HTR2A P28223 1/20 0.45
ADRA1A P35348 1/20 0.45
OPRK1 P41145 1/20 0.45
KCNH2 Q12809 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL516365 0.94 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL9752209 0.94 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Water SCHEMBL2496495 0.94 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Bromide SCHEMBL515994 0.94 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Fluoride Ion SCHEMBL4615583 0.94 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Fluoride Ion SCHEMBL28882550 0.94 SIGMAR1 (0.54) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
Fluoride Ion SCHEMBL64308 0.92 SIGMAR1 (0.52) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL2870339 0.87 SIGMAR1 (0.48) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL7175865 0.87 SIGMAR1 (0.48) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3
SCHEMBL7179621 0.87 SIGMAR1 (0.48) SIGMAR1TAAR1SLC6A2SLC6A4SLC6A3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4428192-B1 RESIN COMPOSITION AJINOMOTO KK (JP) 2025-10-29 EP disclosed
US-20250034415-A1 ACTIVE ENERGY RAY CURABLE INKJET INK, METHOD FOR PRODUCING INKJET INK, INKJET RECORDING METHOD, AND INKJET RECORDING SYSTEM Konica Minolta, Inc. (JP) 2025-01-30 US disclosed
US-20250034397-A1 PIGMENT DISPERSION COMPOSITION, DISPERSION COMPOSITION, ACTIVE ENERGY RAY CURABLE INK COMPOSITION, PRINTING METHOD, AND PRINTING SYSTEM Konica Minolta, Inc. (JP) 2025-01-30 US disclosed
EP-3985691-B1 USE OF MAGNETIC PASTE, CIRCUIT BOARD, AND METHOD OF ITS PRODUCTION AJINOMOTO KK (JP) 2025-01-22 EP disclosed
EP-4438297-A1 RESIN SHEET AJINOMOTO CO., INC. (JP) 2024-10-02 EP disclosed
EP-4428192-A1 RESIN COMPOSITION AJINOMOTO CO., INC. (JP) 2024-09-11 EP disclosed
CN-118599261-A Resin composition 味之素株式会社 2024-09-06 CN disclosed
CN-118234624-A Resin sheet 味之素株式会社 2024-06-21 CN disclosed
CN-116266033-A Photosensitive coloring composition for blue color filter, solid-state imaging element, and liquid crystal display device 东洋油墨SC控股株式会社 2023-06-20 CN disclosed
EP-3985691-A1 MAGNETIC PASTE AJINOMOTO CO., INC. (JP) 2022-04-20 EP disclosed
US-6147148-A WHERE THE ESTER HAS A DEGREE OF ESTERIFICATION OF NOT MORE THAN 50% AJINOMOTO CO., INC. (JP) 2000-11-14 US disclosed
EP-0908491-A2 Thermoplastic resin composition, agent for improving thermal aging resistance of thermoplastic resin, and resin molded article obtained therefrom Ajinomoto Co., Inc. (JP) 1999-04-14 EP disclosed
US-5760257-A AN ADDITION-CONDENSATION COPOLYMER COMPRISING ALLYL GROUP, POLYESTER, POLYAMIDE AND/OR POLYETHER; RECEPTIVITY; ANTIAGGLOMERANTS AJINOMOTO CO., INC. (JP) 1998-06-02 US disclosed
EP-0768321-A2 Pigment dispersant Ajinomoto Co., Ltd. (JP) 1997-04-16 EP disclosed
EP-0502707-B1 Method for production of 3-cyano-3,5,5-trimethyl cyclohexanone NIPPOH CHEMICALS (JP) 1995-10-25 EP disclosed
EP-0337322-B1 PROCESS FOR PRODUCING MONOSILANE MITSUBISHI KASEI CORPORATION (JP) 1993-07-21 EP disclosed
US-5179221-A METHOD FOR PRODUCTION OF 3-CYANO-3,5,5-TRIMETHYL CYCLOHEXANONE NIPPON CHEMICALS CO., LTD. (JP) 1993-01-12 US disclosed
EP-0502707-A1 Method for production of 3-cyano-3,5,5-trimethyl cyclohexanone NIPPOH CHEMICALS CO., LTD. (JP) 1992-09-09 EP disclosed
US-4904460-A Process for producing monosilane MITSUBISHI KASEI CORPORATION (JP) 1990-02-27 US disclosed
EP-0337322-A2 Process for producing monosilane MITSUBISHI KASEI CORPORATION (JP) 1989-10-18 EP disclosed