SCHEMBL5160165

SCHEMBL5160165

CO[Si](C)(CCCNCCNCc1ccccc1)OC

nearest known ligand 0.56

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
CHRM2 P08172 3/20 0.56
MEN1 O00255 1/20 0.53
KMT2A Q03164 1/20 0.53
TDP1 Q9NUW8 1/20 0.53
MAOA P21397 1/20 0.53
SIGMAR1 Q99720 4/20 0.49
SCN8A Q9UQD0 1/20 0.47
GAA P10253 1/20 0.43
MAPT P10636 1/20 0.43
DRD4 P21917 1/20 0.42
BCHE P06276 1/20 0.42
MPO P05164 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2445101 0.97 MAOA (0.56) CHRM2MEN1KMT2ATDP1MAOA
SCHEMBL15361045 0.92 MAOA (0.59) CHRM2MEN1KMT2ATDP1MAOA
SCHEMBL5160242 0.88 SIGMAR1 (0.56) MEN1KMT2ASIGMAR1GAADRD4
SCHEMBL15360359 0.87 MEN1 (0.55) CHRM2MEN1KMT2ATDP1MAOA
SCHEMBL144038 0.86 CHRM2 (0.58) CHRM2MEN1KMT2ATDP1MAOA
Hydrochloric Acid SCHEMBL919007 0.84 CHRM2 (0.56) CHRM2MEN1KMT2ATDP1MAOA
SCHEMBL3921212 0.84 MAOA (0.56) CHRM2MEN1KMT2ATDP1MAOA
SCHEMBL48855 0.82 MAOA (0.58) CHRM2MEN1KMT2ATDP1MAOA
Hydrochloric Acid SCHEMBL9759994 0.81 CHRM2 (0.61) CHRM2MEN1KMT2ATDP1MAOA
SCHEMBL12972136 0.81 CHRM2 (0.45) CHRM2TDP1MAOASCN8A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1348747-B1 Gas barrier coating composition and method for manufacturing same JSR CORP (JP) 2007-02-14 EP disclosed
EP-1106661-B1 Coating composition and hardened film obtained therefrom JSR CORP (JP) 2006-03-08 EP disclosed
US-6992123-B2 Polishing pad JSR CORPORATION (JP) 2006-01-31 US disclosed
US-20040118051-A1 Polishing pad JSR CORPORATION (JP) 2004-06-24 US disclosed
US-6660394-B1 Siloxane-vinyl copolymer, oxazoline crosslinker and organo-metallic betaketone or multifunctional hydrazine; rapid low temperature curing; water, weather, chemical, acid, alkali and wear resistance; durable adhesion JSR CORPORATION (JP) 2003-12-09 US disclosed
US-20030187113-A1 Gas barrier coating composition and method for manufacturing same JSR CORPORATION (JP) 2003-10-02 US disclosed
EP-1348747-A1 Gas barrier coating composition and method for manufacturing same JSR Corporation (JP) 2003-10-01 EP disclosed
EP-1106661-A2 Coating composition and hardened film obtained therefrom JSR Corporation (JP) 2001-06-13 EP disclosed