Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 4/20 | 0.43 |
| ▸ | ACHE | P22303 | 3/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.35 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.35 |
| ▸ | CA1 | P00915 | 2/20 | 0.35 |
| ▸ | CA2 | P00918 | 2/20 | 0.35 |
| ▸ | CA7 | P43166 | 2/20 | 0.35 |
| ▸ | CA9 | Q16790 | 2/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.33 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.32 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.32 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.30 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | HTT | P42858 | 1/20 | 0.30 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.30 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.30 |
| ▸ | ESR1 | P03372 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29498343 | 0.91 | ACHE (0.39) | TSHRACHEALDH1A1CA1CA2 | |
| SCHEMBL7896184 | 0.84 | TRPA1 (0.38) | TSHRACHELMNAALDH1A1CA1 | |
| SCHEMBL146110 | 0.84 | TSHR (0.53) | TSHRACHELMNAALOX12ALDH1A1 | |
| SCHEMBL30047690 | 0.82 | ACHE (0.32) | ACHE | |
| Fluoride Ion SCHEMBL9296021 | 0.81 | TSHR (0.50) | TSHRACHELMNAALOX12ALDH1A1 | |
| Hydrochloric Acid SCHEMBL3843197 | 0.81 | TSHR (0.50) | TSHRACHELMNAALOX12ALDH1A1 | |
| Iodide SCHEMBL10896124 | 0.81 | TSHR (0.50) | TSHRACHELMNAALOX12ALDH1A1 | |
| Trifluoromethanesulfonic Acid SCHEMBL31294754 | 0.80 | GPR3 (0.40) | TSHRACHE | |
| SCHEMBL10492059 | 0.79 | MEN1 (0.41) | ACHELMNAALOX12ALDH1A1CA1 | |
| SCHEMBL29848559 | 0.79 | LMNA (0.35) | TSHRACHELMNATDP1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 81 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118818901-A | KrF negative photoresist and preparation method and patterning forming method thereof | 厦门恒坤新材料科技股份有限公司 | 2024-10-22 | — | — | CN | disclosed |
| CN-118459768-A | Epoxy organic silicon resin for solvent-free cationic UV curing release agent, preparation method and application | 浙江新安化工集团股份有限公司 | 2024-08-09 | — | — | CN | disclosed |
| US-9707757-B2 | Photosensitive negative resin composition | CANON KABUSHIKI KAISHA (JP) | 2017-07-18 | — | — | US | disclosed |
| US-9707757-B2 | Photosensitive negative resin composition | CANON KABUSHIKI KAISHA (JP) | 2017-07-18 | — | — | US | disclosed |
| US-20140307022-A1 | PHOTOSENSITIVE NEGATIVE RESIN COMPOSITION | CANON KABUSHIKI KAISHA (JP) | 2014-10-16 | — | — | US | disclosed |
| US-8652753-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2014-02-18 | — | — | US | disclosed |
| US-8563219-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-22 | — | — | US | disclosed |
| US-20130022921-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-24 | — | — | US | disclosed |
| US-20120219909-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-08-30 | — | — | US | disclosed |
| EP-1756816-A1 | HOLOGRAPHIC STORAGE MEDIUM WITH THERMALLY CROSSLINKED POLYSILOXANE BINDER | GENERAL ELECTRIC COMPANY (US) | 2007-02-28 | — | — | EP | disclosed |
| US-5102771-A | Containing photoinitiator and polymer containing alkoxyalkyl ester groups | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1992-04-07 | — | — | US | disclosed |
| EP-0462763-A1 | Thermally developable light-sensitive layers containing photobleachable sensitizers | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1991-12-27 | — | — | EP | disclosed |
| EP-0302610-A2 | Light sensitive element | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-02-08 | — | — | EP | disclosed |
| EP-0119068-B1 | METHOD FOR PREPARING DIARYL IODONIUM SALTS | NIPPON PETROCHEMICALS COMPANY, LIMITED (JP) | 1987-04-22 | — | — | EP | disclosed |
| US-4659840-A | COUPLING AROMATIC HYDROCARBON WITH ARYLIODIDE IN PRESENCE OF SULFURIC ACID AND OXIDIZING AGENT | NIPPON PETROCHEMICALS CO., LTD. (JP) | 1987-04-21 | — | — | US | disclosed |
| EP-0061898-B1 | VISIBLE LIGHT SENSITIVE, THERMALLY DEVELOPABLE IMAGING SYSTEMS | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-06-19 | — | — | EP | disclosed |
| EP-0119068-A1 | Method for preparing diaryl iodonium salts | NIPPON PETROCHEMICALS COMPANY, LIMITED (JP) | 1984-09-19 | — | — | EP | disclosed |
| US-4460677-A | Visible light sensitive, thermally developable imaging systems | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1984-07-17 | — | — | US | disclosed |
| US-4386154-A | ACYLATED LEUCO DYES | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1983-05-31 | — | — | US | disclosed |
| EP-0061898-A1 | Visible light sensitive, thermally developable imaging systems | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1982-10-06 | — | — | EP | disclosed |