SCHEMBL516260

SCHEMBL516260

CC(=O)CC(=O)CCO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL61062 0.84 KDM4E (0.78)
SCHEMBL516391 0.83 KDM4E (0.54)
SCHEMBL9244411 0.81 KDM4E (0.52)
SCHEMBL30567056 0.81 ALDH1A1 (0.50)
SCHEMBL2305759 0.79 KDM4E (0.50)
SCHEMBL7016070 0.79 KDM4E (0.70)
SCHEMBL8846311 0.79 KDM4E (0.62)
SCHEMBL235434 0.77 KDM4E (0.58)
SCHEMBL23521340 0.77 ALDH1A1 (0.59)
SCHEMBL28931257 0.77 ALDH1A1 (0.59)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117327171-B Modified recombinant humanized collagen and application thereof in vaginal dressing 江苏亨瑞生物医药科技有限公司 2024-03-12 CN claimed
CN-117327171-A Modified recombinant humanized collagen and application thereof in vaginal dressing 江苏亨瑞生物医药科技有限公司 2024-01-02 CN claimed
JP-6033035-A None JP disclosed
JP-2248342-A None JP disclosed
US-11988809-B2 Laminate, antireflection product, and manufacturing method thereof FUJIFILM CORPORATION (JP) 2024-05-21 US disclosed
CN-117327171-B Modified recombinant humanized collagen and application thereof in vaginal dressing 江苏亨瑞生物医药科技有限公司 2024-03-12 CN disclosed
CN-117327171-A Modified recombinant humanized collagen and application thereof in vaginal dressing 江苏亨瑞生物医药科技有限公司 2024-01-02 CN disclosed
US-20220075095-A1 LAMINATE, ANTIREFLECTION PRODUCT, AND MANUFACTURING METHOD THEREOF FUJIFILM CORPORATION (JP) 2022-03-10 US disclosed
US-11209575-B2 Laminate, antireflection product, and manufacturing method thereof FUJIFILM CORPORATION (JP) 2021-12-28 US disclosed
US-20190162878-A1 LAMINATE, ANTIREFLECTION PRODUCT, AND MANUFACTURING METHOD THEREOF FUJIFILM CORPORATION (JP) 2019-05-30 US disclosed
US-10082605-B2 Manufacturing method of antireflection article, antireflection article, cover glass, and image display device FUJIFILM CORPORATION (JP) 2018-09-25 US disclosed
WO-2007058373-A1 SURFACE-HYDROPHILIC STRUCTURE FUJIFILM CORPORATION (JP) 2007-05-24 WO disclosed
WO-2007058374-A1 HYDROPHILIC MEMBER AND PROCESS FOR PRODUCING THE SAME FUJIFILM CORPORATION (JP) 2007-05-24 WO disclosed
EP-1302313-B1 Lithographic printing plate precursor FUJI PHOTO FILM CO LTD (JP) 2006-12-13 EP disclosed
US-6852469-B2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2005-02-08 US disclosed
US-20030113666-A1 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. 2003-06-19 US disclosed
EP-1302313-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2003-04-16 EP disclosed
JP-H0633035-A USE OF POLYALKYLENEGLYCOL DIESTER AS FORMALDEHYDE COLLECTOR AND FINISHING PROCESS FOR TEXTILE INDUSTRY SOC FR HOECHST 1994-02-08 JP disclosed
JP-H02248342-A PRODUCTION OF SILICA GLASS HITACHI CHEM CO LTD 1990-10-04 JP disclosed
EP-0350320-A2 Production of unsaturated compounds PHARMAGLOBE LABORATORIES LTD (CA) 1990-01-10 EP disclosed