Etidronic Acid

Etidronic Acid

SCHEMBL5163524

CC(O)(P(=O)(O)O)P(=O)(O)O.NC(P(=O)(O)O)P(=O)(O)O.O=P(O)(O)CP(=O)(O)O.O=P(O)(O)CP(=O)(O)O

nearest known ligand 0.54

Full drug profile on Sugi Atlas →

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
LMNA P02545 1/20 0.54
KDM4E B2RXH2 1/20 0.42
MMP2 P08253 1/20 0.42
THRB P10828 1/20 0.42
MAPK1 P28482 1/20 0.42
HSD17B10 Q99714 1/20 0.42
FDPS P14324 2/20 0.41
LAP3 P28838 4/20 0.37
ANPEP P15144 5/20 0.34
GRM4 Q14833 1/20 0.34
ERAP1 Q9NZ08 1/20 0.34
ERAP2 Q6P179 1/20 0.33
OTC P00480 1/20 0.33
GLUL P15104 1/20 0.32
ALDH1A1 P00352 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
METAP1 P53582 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Etidronic Acid SCHEMBL8370480 0.87 LMNA (0.72) LMNAKDM4EMMP2THRBMAPK1
Aminomethylenebisphosphonic Acid SCHEMBL1573309 0.85 KDM4E (0.43) KDM4EMMP2THRBMAPK1HSD17B10
Aminomethylenebisphosphonic Acid SCHEMBL7769358 0.82 KDM4E (0.62) KDM4EMMP2THRBMAPK1HSD17B10
Aminomethylenebisphosphonic Acid SCHEMBL11300742 0.76 KDM4E (0.48) KDM4EMMP2THRBMAPK1HSD17B10
Aminomethylenebisphosphonic Acid SCHEMBL11025149 0.75 FDPS (0.43) LMNAFDPSLAP3ANPEPGRM4
Aminomethylenebisphosphonic Acid SCHEMBL10355230 0.75 KDM4E (0.53) LMNAKDM4EMMP2THRBMAPK1
Etidronic Acid SCHEMBL18607 0.74 LMNA (1.00) LMNAMMP2THRBFDPSGRM4
Etidronic Acid SCHEMBL10532992 0.74 LMNA (1.00) LMNAMMP2THRBFDPSGRM4
Etidronic Acid SCHEMBL28115152 0.72 LMNA (0.72) LMNAFDPSGRM4ALDH1A1
Medronic Acid SCHEMBL28647857 0.71 KDM4E (0.62) KDM4EMMP2THRBMAPK1HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7297669-B2 Copper chemical mechanical polishing solutions using sulfonated amphiprotic agents ARKEMA INC. (US) 2007-11-20 US disclosed
US-20050037936-A1 Copper chemical mechanical polishing solutions using sulfonated amphiprotic agents ARKEMA INC. 2005-02-17 US disclosed
US-6803353-B2 ADDITION OF SULFONATED ZWITTERIONS TO CONVENTIONAL SLURRIES INCREASES THE COPPER REMOVAL RATES AND ALSO OFFERS BUFFERING ACTION TO THE SLURRY ATOFINA CHEMICALS, INC. 2004-10-12 US disclosed
US-20040092106-A1 ADDITION OF SULFONATED ZWITTERIONS TO CONVENTIONAL SLURRIES INCREASES THE COPPER REMOVAL RATES AND ALSO OFFERS BUFFERING ACTION TO THE SLURRY ARKEMA INC. 2004-05-13 US disclosed