Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 4/20 | 0.45 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.45 |
| ▸ | MAPT | P10636 | 6/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 6/20 | 0.41 |
| ▸ | GAA | P10253 | 3/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | POLB | P06746 | 2/20 | 0.41 |
| ▸ | RAB9A | P51151 | 1/20 | 0.41 |
| ▸ | ESR1 | P03372 | 2/20 | 0.39 |
| ▸ | ESR2 | Q92731 | 2/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.38 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.38 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | HPGD | P15428 | 3/20 | 0.34 |
| ▸ | USP2 | O75604 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | RECQL | P46063 | 6/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23005780 | 0.86 | ESR1 (0.50) | ALOX15HSD17B10CYP3A4MAPTKDM4E | |
| SCHEMBL5190865 | 0.84 | ALDH1A1 (0.57) | ALOX15HSD17B10CYP3A4MAPTKDM4E | |
| SCHEMBL7803038 | 0.81 | ALDH1A1 (0.39) | ALOX15CYP3A4GAAKMT2AMEN1 | |
| SCHEMBL18999717 | 0.78 | ALDH1A1 (0.46) | ESR1ESR2ALDH1A1SHBG | |
| SCHEMBL27498170 | 0.77 | ALOX15 (0.42) | ALOX15HSD17B10CYP3A4MAPTKDM4E | |
| SCHEMBL27533485 | 0.77 | ALOX15 (0.50) | ALOX15HSD17B10CYP3A4MAPTKDM4E | |
| SCHEMBL3277990 | 0.76 | CYP3A4 (0.45) | ALOX15CYP3A4MAPTKDM4EGAA | |
| SCHEMBL16736878 | 0.76 | TRPA1 (0.59) | ALOX15HSD17B10CYP3A4MAPTKDM4E | |
| SCHEMBL3789315 | 0.76 | ALOX15 (0.41) | ALOX15HSD17B10CYP3A4MAPTKDM4E | |
| SCHEMBL6422982 | 0.74 | ALOX15 (0.52) | ALOX15HSD17B10CYP3A4MAPTKDM4E |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-110874015-B | Photosensitive resin composition, photosensitive resin layer using same, and electronic device | 三星SDI株式会社 | 2023-02-28 | — | — | CN | disclosed |
| CN-110088680-B | Double-layer photosensitive layer roll | 旭化成株式会社 | 2022-12-30 | — | — | CN | disclosed |
| CN-115210648-A | Photosensitive resin composition, photosensitive sheet, cured film, method for producing cured film, electronic component, antenna element, semiconductor package, and display device | 东丽株式会社 | 2022-10-18 | — | — | CN | disclosed |
| CN-114895527-A | Positive photosensitive resin precursor composition, preparation method and application thereof | 南通晶爱微电子科技有限公司 | 2022-08-12 | — | — | CN | disclosed |
| CN-107430334-B | Positive photosensitive resin composition, method for producing patterned cured film, and electronic component | 艾曲迪微系统股份有限公司 | 2021-07-30 | — | — | CN | disclosed |
| CN-112771447-A | Positive photosensitive resin composition, photosensitive resin film using the same, and electronic device | 三星SDI株式会社 | 2021-05-07 | — | — | CN | disclosed |
| CN-112592476-A | Method for producing polybenzoxazole precursor and polybenzoxazole precursor | 太阳控股株式会社 | 2021-04-02 | — | — | CN | disclosed |
| CN-112585536-A | Photosensitive resin composition, dry film, cured product, and electronic component | 太阳控股株式会社 | 2021-03-30 | — | — | CN | disclosed |
| CN-112415852-A | Positive photosensitive resin composition | 太阳控股株式会社 | 2021-02-26 | — | — | CN | disclosed |
| CN-111819493-A | Photosensitive resin composition, dry film, cured product, printed wiring board, and semiconductor element | 太阳控股株式会社 | 2020-10-23 | — | — | CN | disclosed |
| CN-110989294-A | Photosensitive resin composition, photosensitive resin layer, and electronic device | 三星SDI株式会社 | 2020-04-10 | — | — | CN | disclosed |
| CN-110967928-A | Positive photosensitive resin composition, photosensitive resin layer, and electronic device | 三星SDI株式会社 | 2020-04-07 | — | — | CN | disclosed |
| WO-2020067638-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM USING SAME, AND ELECTRONIC DEVICE | 삼성에스디아이 주식회사 | 2020-04-02 | — | — | WO | disclosed |
| CN-110945427-A | Photosensitive resin composition, dry film, cured product, printed wiring board, semiconductor element, and electronic component | 太阳控股株式会社 | 2020-03-31 | — | — | CN | disclosed |
| CN-110874015-A | Photosensitive resin composition, photosensitive resin layer using same, and electronic device | 三星SDI株式会社 | 2020-03-10 | — | — | CN | disclosed |
| US-9323147-B2 | Positive photosensitive resin composition, photosensitive resin film prepared by using the same, and display device | SAMSUNG SDI CO., LTD. (KR) | 2016-04-26 | — | — | US | disclosed |
| US-20150168835-A1 | Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device | SAMSUNG SDI CO., LTD. (KR) | 2015-06-18 | — | — | US | disclosed |
| US-20150111153-A1 | Positive Photosensitive Resin Composition, Photosensitive Resin Film Prepared by Using the Same, and Display Device | CHEIL INDUSTRIES INC. (KR) | 2015-04-23 | — | — | US | disclosed |
| US-8735029-B2 | Positive photosensitive resin composition, and display device and organic light emitting device using the same | CHEIL INDUSTRIES INC. (KR) | 2014-05-27 | — | — | US | disclosed |
| EP-1811340-A2 | Photosensitive resin composition and manufacturing method of semiconductor device using the same | Fujifilm Corporation (JP) | 2007-07-25 | — | — | EP | disclosed |