SCHEMBL5193831

SCHEMBL5193831

O=S(=O)(O)C12CC3CC(CC(O)(C3)C1)C2

nearest known ligand 0.45

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
PKM P14618 1/20 0.45
MAPT P10636 1/20 0.42
HPGD P15428 1/20 0.42
HSD11B1 P28845 4/20 0.39
ALDH1A1 P00352 2/20 0.36
DPP4 P27487 5/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
GAA P10253 2/20 0.32
CNR2 P34972 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15249744 0.79 TSHR (0.43) GAA
SCHEMBL4003082 0.78 THRB (0.43) DPP4GAA
SCHEMBL36264 0.77 GAA (0.44) HSD11B1ALDH1A1GAA
Hydrochloric Acid SCHEMBL28181407 0.75 GAA (0.42) ALDH1A1GAA
SCHEMBL15772817 0.75 GAA (0.42) HSD11B1ALDH1A1GAA
Water SCHEMBL2573342 0.75 GAA (0.42) HSD11B1ALDH1A1GAA
SCHEMBL15773055 0.75 GAA (0.42) HSD11B1ALDH1A1GAA
SCHEMBL1239169 0.75 GAA (0.42) HSD11B1ALDH1A1GAA
SCHEMBL4004845 0.75 ALDH1A1 (0.47) PKMHSD11B1ALDH1A1GAA
SCHEMBL15858211 0.74 PKM (0.64) PKMHSD11B1ALDH1A1DPP4NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230134822-A1 AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 US disclosed
US-10481495-B2 Topcoat compositions containing fluorinated thermal acid generators ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-11-19 US disclosed
US-20190243246-A1 TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2019-08-08 US disclosed
US-10241411-B2 Topcoat compositions containing fluorinated thermal acid generators ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2019-03-26 US disclosed
US-20180118968-A1 TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2018-05-03 US disclosed
US-20180118968-A1 TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2018-05-03 US disclosed
EP-1288186-B1 Preparation process of vinyl ether compounds DAICEL CHEM (JP) 2007-09-19 EP disclosed
US-7271297-B2 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2007-09-18 US disclosed
EP-1826196-A2 Vinyl ether compounds Daicel Chemical Industries, Ltd. (JP) 2007-08-29 EP disclosed
US-20060205957-A1 Process for producing vinyl ether compounds ISHII YASUTAKA 2006-09-14 US disclosed
US-7074970-B2 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2006-07-11 US disclosed
US-20030083529-A1 Process for producing vinyl ether compounds DAICEL CHEMICAL INDUSTRIES, LTD. (JP) 2003-05-01 US disclosed
EP-1288186-A2 Vinyl ether compounds and preparation process thereof Daicel Chemical Industries, Ltd. (JP) 2003-03-05 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20060205957-A1 Process for producing vinyl ether compounds ETV6, CYP3A4, SUV39H2 PKM 1297/4885MAPT 3799/4885HPGD 1055/4885
US-20030083529-A1 Process for producing vinyl ether compounds SRD5A2, RPS4X, RUVBL2 PKM 1756/4885MAPT 4125/4885HPGD 2085/4885
US-20230134822-A1 AMINE COMPOUND, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS GFER, GNMT, DNER PKM 2729/4885MAPT 1771/4885HPGD 3421/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.