SCHEMBL51946

SCHEMBL51946

CC(C)(C)c1ccc(S(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)(c2ccc(C(C)(C)C)cc2)c2ccc(C(C)(C)C)cc2)cc1

nearest known ligand 0.43

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
CA1 P00915 9/20 0.43
CA2 P00918 9/20 0.43
RORA P35398 1/20 0.43
ALDH1A1 P00352 2/20 0.42
LMNA P02545 1/20 0.39
GAA P10253 1/20 0.39
HSD11B1 P28845 6/20 0.38
CA9 Q16790 1/20 0.36
HSD17B3 P37058 1/20 0.35
BCHE P06276 1/20 0.35
ACHE P22303 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL678362 0.98 CA1 (0.44) CA1CA2RORAALDH1A1LMNA
SCHEMBL1593146 0.95 RORA (0.43) CA1CA2RORAALDH1A1LMNA
SCHEMBL2438154 0.95 ALDH1A1 (0.46) CA1CA2RORAALDH1A1LMNA
SCHEMBL3139776 0.94 HSD11B1 (0.47) CA1CA2RORAALDH1A1HSD11B1
SCHEMBL384050 0.94 HSD11B1 (0.47) CA1CA2RORAALDH1A1HSD11B1
SCHEMBL384931 0.93 HSD11B1 (0.46) CA1CA2RORAALDH1A1HSD11B1
SCHEMBL3135858 0.93 HSD11B1 (0.46) CA1CA2RORAALDH1A1HSD11B1
SCHEMBL3137403 0.93 HSD11B1 (0.46) CA1CA2RORAALDH1A1HSD11B1
SCHEMBL3135789 0.93 HSD11B1 (0.46) CA1CA2RORAALDH1A1HSD11B1
SCHEMBL2436995 0.92 ALDH1A1 (0.46) CA1CA2RORAALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 443 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250208517-A1 ACIDIC SPIN-ON CARBON (SOC) LAYER FOR EUV LITHOGRAPHY BREWER SCIENCE, INC. 2025-06-26 US claimed
US-20250177927-A1 SUPPORTED MEMBRANES BY THERMAL AND UV INITITATED MASS POLYMERIZATION PROMERUS, LLC (US) 2025-06-05 US claimed
US-20250122402-A1 LONG SHELF-LIFE STABLE MASS POLYMERIZABLE POLYCYCLOOLEFIN COMPOSITIONS CONTAINING PYRIDINE LIGATED PALLADIUM COMPOUNDS PROMERUS, LLC (US) 2025-04-17 US claimed
US-12187851-B2 Network polymers and methods of making and using same THE REGENTS OF THE UNIVERSITY OF COLORADO, A BODY CORPORATE (US) 2025-01-07 US claimed
US-11897991-B2 UV active derivatives of Pd(AcAc)2 catalyzed polycycloolefin compositions as optical materials PROMERUS, LLC (US) 2024-02-13 US claimed
US-11768435-B2 Bottom-up conformal coating and photopatterning on PAG-immobilized surfaces BREWER SCIENCE, INC. (US) 2023-09-26 US claimed
US-11746166-B2 UV active derivatives of pd(AcAc)2L catalyzed polycycloolefin compositions as optical materials PROMERUS, LLC (US) 2023-09-05 US claimed
WO-2023158768-A1 DUAL CATALYST SYSTEM FOR MASS ROMP AND CATIONIC POLYMERIZABLE COMPOSITIONS PROMERUS, LLC (US) 2023-08-24 WO claimed
US-11667731-B2 Stabilized UV active organopalladium compounds as vinyl addition catalysts PROMERUS, LLC (US) 2023-06-06 US claimed
US-20230119934-A1 NETWORK POLYMERS AND METHODS OF MAKING AND USING SAME UNIV COLORADO REGENTS (US) 2023-04-20 US claimed
US-20150160551-A1 POSITIVE-TONE, CHEMICALLY AMPLIFIED, AQUEOUS-DEVELOPABLE, PERMANENT DIELECTRIC GEORGIA TECH RESEARCH CORPORATION (US) 2015-06-11 US claimed
US-20150152328-A1 PHOTOACTIVATED ETCHING PASTE AND ITS USE MERCK PATENT GMBH (DE) 2015-06-04 US claimed
EP-2856519-A1 PHOTOACTIVATED ETCHING PASTE AND ITS USE Merck Patent GmbH (DE) 2015-04-08 EP claimed
EP-1099983-B1 Chemically amplified positive resist composition and patterning method SHINETSU CHEMICAL CO (JP) 2014-08-06 EP claimed
WO-2014005011-A2 POSITIVE-TONE, CHEMICALLY AMPLIFIED, AQUEOUS-DEVELOPABLE, PERMANENT DIELECTRIC GEORGIA TECH RESEARCH CORPORATION (US) 2014-01-03 WO claimed
WO-2013182265-A1 PHOTOACTIVATED ETCHING PASTE AND ITS USE MERCK PATENT GMBH (DE) 2013-12-12 WO claimed
EP-2033190-A2 COATING SYSTEM FOR PIRACY-PROTECTED OPTICAL MEDIUM Veriloc LLC (US) 2009-03-11 EP claimed
US-20080057328-A1 Photoinitiators and optical state change materials with reduced inadvertant activation tendency VERILOC, LLC 2008-03-06 US claimed
WO-2008002923-A2 COATING SYSTEM FOR PIRACY-PROTECTED OPTICAL MEDIUM VERILOC LLC (US) 2008-01-03 WO claimed
EP-1033624-A1 RADIATION-SENSITIVE COMPOSITION OF CHEMICAL AMPLIFICATION TYPE Clariant International Ltd. (CH) 2000-09-06 EP claimed