SCHEMBL384050

SCHEMBL384050

CC(C)(C)c1ccc(S(OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 9/20 0.47
NR1H2 P55055 3/20 0.40
CA1 P00915 4/20 0.39
CA2 P00918 4/20 0.39
RORA P35398 1/20 0.39
NR1H3 Q13133 2/20 0.39
ALDH1A1 P00352 2/20 0.38
HSD17B3 P37058 1/20 0.38
NPC1 O15118 1/20 0.38
RECQL P46063 1/20 0.38
RAB9A P51151 1/20 0.38
NR1I2 O75469 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3139776 1.00 HSD11B1 (0.47) HSD11B1NR1H2CA1CA2RORA
SCHEMBL3135858 0.99 HSD11B1 (0.46) HSD11B1NR1H2CA1CA2RORA
SCHEMBL3135789 0.99 HSD11B1 (0.46) HSD11B1NR1H2CA1CA2RORA
SCHEMBL3137403 0.99 HSD11B1 (0.46) HSD11B1NR1H2CA1CA2RORA
SCHEMBL384931 0.99 HSD11B1 (0.46) HSD11B1NR1H2CA1CA2RORA
SCHEMBL2438821 0.96 HSD11B1 (0.47) HSD11B1CA1CA2RORANR1H3
SCHEMBL51946 0.94 CA1 (0.43) HSD11B1CA1CA2RORAALDH1A1
SCHEMBL678362 0.93 CA1 (0.44) HSD11B1CA1CA2RORAALDH1A1
SCHEMBL2435496 0.93 HSD11B1 (0.47) HSD11B1CA1CA2RORANR1H3
SCHEMBL1593146 0.90 RORA (0.43) HSD11B1CA1CA2RORAALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 270 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3010943-B1 CURABLE COMPOSITION, FILM, AND METHOD OF PRODUCING FILM CANON KK (JP) 2024-04-03 EP disclosed
US-11884839-B2 Acetal-protected silanol group-containing polysiloxane composition NISSAN CHEMICAL CORPORATION (JP) 2024-01-30 US disclosed
US-11561472-B2 Radiation sensitive composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-01-24 US disclosed
EP-3309614-B1 RADIATION SENSITIVE COMPOSITION NISSAN CHEMICAL CORP (JP) 2021-11-10 EP disclosed
EP-2841255-B1 RESIN PRODUCTION METHOD AND RESIN PRODUCTION APPARATUS CANON KK (JP) 2020-05-13 EP disclosed
US-10472445-B2 Photocurable composition and method for manufacturing film CANON KABUSHIKI KAISHA (JP) 2019-11-12 US disclosed
US-10421853-B2 Photosensitive gas generating agent and photocurable composition CANON KABUSHIKI KAISHA (JP) 2019-09-24 US disclosed
US-20190185707-A1 ACETAL-PROTECTED SILANOL GROUP-CONTAINING POLYSILOXANE COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2019-06-20 US disclosed
EP-2758987-B1 METHOD OF FORMING A FILM CANON KK (JP) 2019-03-20 EP disclosed
US-10208183-B2 Curable composition, film, and method of producing film CANON KABUSHIKI KAISHA (JP) 2019-02-19 US disclosed
US-20030022095-A1 Negative type radiation sensitive resin composition JSR CORPORATION (JP) 2003-01-30 US disclosed
US-6403288-B1 COATING WITH COPOLYMER COMPRISING HYDROXYSTYRENE DERIVATIVE MONOMER HAVING ACID DISSOCIABLE GROUP; EXPOSURE TO RADIATION; DEVELOPMENT JSR CORPORATION (JP) 2002-06-11 US disclosed
US-6337171-B1 AS A RESIST APPLICABLE TO FAR ULTRAVIOLET RAYS SUCH AS A KRF EXCIMER LASER, CHARGED PARTICLE RAYS SUCH AS ELECTRON BEAMS, AND X-RAYS JSR CORPORATION (JP) 2002-01-08 US disclosed
US-20010038971-A1 Chemical amplification, positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-11-08 US disclosed
US-20010033994-A1 Chemical amplification, positive resist compositions SHIN-ETSU CHEMICAL CO., LTD. (JP) 2001-10-25 US disclosed
US-6143460-A PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION JSR CORPORATION (JP) 2000-11-07 US disclosed
US-6136500-A CONTAINS A PHOTOACID GENERATOR COMPRISING A COMBINATION OF A COMPOUND THAT GENERATES A CARBOXYLIC ACID UPON EXPOSURE TO RADIATION AND ANOTHER COMPOUND THAT GENERATES ANOTHER ACID UPON EXPOSURE TO RADIATION JSR CORPORATION (JP) 2000-10-24 US disclosed
EP-1011029-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2000-06-21 EP disclosed
EP-0959389-A1 Diazodisulfone compound and radiation-sensitive resin composition JSR Corporation (JP) 1999-11-24 EP disclosed
EP-0898201-A1 Radiation sensitive resin composition JSR Corporation (JP) 1999-02-24 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11561472-B2 Radiation sensitive composition RER1, RAD1, RAD51 HSD11B1 1997/4885NR1H2 2217/4885CA1 2755/4885
US-10421853-B2 Photosensitive gas generating agent and photocurable composition PFN1, PFAS, FRG1 HSD11B1 4332/4885NR1H2 4168/4885CA1 3547/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.