SCHEMBL526123

SCHEMBL526123

C=Cc1ccccc1C(O)C=C

nearest known ligand 0.48

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.48
MEN1 O00255 1/20 0.35
LMNA P02545 1/20 0.35
THRB P10828 1/20 0.35
BLM P54132 1/20 0.35
KMT2A Q03164 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
TSHR P16473 1/20 0.33
TRIM24 O15164 1/20 0.33
TRIM33 Q9UPN9 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1325378 0.87 LMNA (0.48) ALDH1A1MEN1LMNATHRBBLM
SCHEMBL7594286 0.85 ALDH1A1 (0.39) ALDH1A1MEN1KMT2ATSHR
SCHEMBL2944385 0.81 ALDH1A1 (0.46) ALDH1A1MEN1LMNATHRBBLM
SCHEMBL15388937 0.79 ALDH1A1 (0.35) ALDH1A1TSHR
SCHEMBL9511172 0.79 FAAH (0.31) ALDH1A1LMNABLMTSHR
SCHEMBL9284905 0.78 CA1 (0.51) LMNA
SCHEMBL5141462 0.77 ALDH1A1 (0.43) ALDH1A1TSHR
SCHEMBL9555419 0.77 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL9815785 0.77 ALDH1A1 (0.33) ALDH1A1TSHR
SCHEMBL387118 0.77 GABRA1 (0.48) ALDH1A1MEN1LMNABLMKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240191129-A1 WATER-BASED FRICTION-REDUCING SLURRY COMPOSITIONS, FORMATION TREATING FLUIDS THEREFROM, AND METHOD FOR MAKING AND USING SAME PfP Industries LLC (US) 2024-06-13 US claimed
US-20240010774-A1 SOLID-PHASE SYNTHESIS CARRIER, PREPARATION METHOD THEREFOR AND USE THEREOF SUNRESIN NEW MATERIALS CO. LTD. (CN) 2024-01-11 US claimed
US-20230312859-A1 POROUS RESIN USED TO SOLID PHASE SYNTHESSIS AND PREPARATION METHOD THEREFOR SUNRESIN NEW MATERIALS CO. LTD. (CN) 2023-10-05 US claimed
EP-4190825-A1 SOLID-PHASE SYNTHESIS CARRIER, PREPARATION METHOD THEREFOR AND USE THEREOF Sunresin New Materials Co. Ltd., Xi'an (CN) 2023-06-07 EP claimed
EP-4177281-A1 POROUS RESIN USED TO SOLID PHASE SYNTHESIS AND PREPARATION METHOD THEREFOR Sunresin New Materials Co. Ltd., Xi'an (CN) 2023-05-10 EP claimed
US-8802745-B2 Porous resin bead and method for producing nucleic acid using the same NITTO DENKO CORPORATION (JP) 2014-08-12 US claimed
US-8653152-B2 Porous resin bead and method for producing nucleic acid using the same NITTO DENKO CORPORATION (JP) 2014-02-18 US claimed
JP-9255730-A None JP disclosed
US-20240010774-A1 SOLID-PHASE SYNTHESIS CARRIER, PREPARATION METHOD THEREFOR AND USE THEREOF SUNRESIN NEW MATERIALS CO. LTD. (CN) 2024-01-11 US disclosed
US-20230312859-A1 POROUS RESIN USED TO SOLID PHASE SYNTHESSIS AND PREPARATION METHOD THEREFOR SUNRESIN NEW MATERIALS CO. LTD. (CN) 2023-10-05 US disclosed
EP-4190825-A1 SOLID-PHASE SYNTHESIS CARRIER, PREPARATION METHOD THEREFOR AND USE THEREOF Sunresin New Materials Co. Ltd., Xi'an (CN) 2023-06-07 EP disclosed
EP-4177281-A1 POROUS RESIN USED TO SOLID PHASE SYNTHESIS AND PREPARATION METHOD THEREFOR Sunresin New Materials Co. Ltd., Xi'an (CN) 2023-05-10 EP disclosed
CN-114539459-A Solid-phase synthesis carrier and preparation method and application thereof 西安蓝晓科技新材料股份有限公司 2022-05-27 CN disclosed
US-5145880-A LIQUID, REACTIVE COMPOSITIONS ENDOWED WITH HIGH POLYMERIZATION SPEED, CONTAINING POLYISOCYANATES AND COMPOUNDS WITH ONE OR MORE EPOXY GROUPS ENICHEM S.P.A. (IT) 1992-09-08 US disclosed
EP-0454207-A1 Liquid, reactive compositions endowed with high polymerization speed, containing polyisocyanates and compounds with one or more epoxy groups ENICHEM S.p.A. (IT) 1991-10-30 EP disclosed
US-5019494-A Hydrophilic Colloid, Dextran, Ionic Polymer FUJI PHOTO FILM CO., LTD. (JP) 1991-05-28 US disclosed
US-5015562-A Light-sensitive silver halide element containing modant, dye and sonic polymer FUJI PHOTO FILM CO., LTD. (JP) 1991-05-14 US disclosed
US-4720345-A Semipermeable membranes of modified styrene-based polymers, process for their manufacture and their use ALIGENA AG (CH) 1988-01-19 US disclosed
US-4438245-A FOR LIGHT SENSITIVE ELEMENTS FUJI PHOTO FILM CO., LTD. (JP) 1984-03-20 US disclosed
US-3945831-A Photosensitive resins containing a thienylacrylic acid ester or amide group FUJI PHOTO FILM CO., LTD. (JA) 1976-03-23 US disclosed