SCHEMBL5325828

SCHEMBL5325828

N#Cc1cnn2c(-c3ccccc3)c(-c3c(F)cc(F)cc3F)c(Cl)nc12

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CSNK2A1 P68400 7/20 0.47
ALDH1A1 P00352 4/20 0.47
KDM4E B2RXH2 4/20 0.47
HPGD P15428 3/20 0.47
GLA P06280 1/20 0.47
MAPK1 P28482 1/20 0.47
HSD17B10 Q99714 1/20 0.47
CLK4 Q9HAZ1 1/20 0.42
CDK2 P24941 2/20 0.40
HTT P42858 1/20 0.38
NPSR1 Q6W5P4 3/20 0.38
TDP1 Q9NUW8 1/20 0.38
CYP11B1 P15538 1/20 0.36
CYP11B2 P19099 1/20 0.36
MDM2 Q00987 1/20 0.36
CYP1A2 P05177 1/20 0.36
CYP2C9 P11712 1/20 0.36
CYP2C19 P33261 1/20 0.36
KMT2A Q03164 1/20 0.35
GABRA1 P14867 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5320636 0.88 CSNK2A1 (0.48) CSNK2A1ALDH1A1KDM4EHPGDGLA
SCHEMBL5326152 0.88 KDM4E (0.54) CSNK2A1ALDH1A1KDM4EHPGDGLA
SCHEMBL5323448 0.87 CSNK2A1 (0.47) CSNK2A1ALDH1A1KDM4EHPGDGLA
SCHEMBL5321374 0.84 KDM4E (0.47) CSNK2A1ALDH1A1KDM4EHPGDGLA
SCHEMBL5594559 0.82 CSNK2A1 (0.43) CSNK2A1ALDH1A1KDM4EHPGDGLA
SCHEMBL14463752 0.75 CDK2 (0.54) CSNK2A1ALDH1A1KDM4EHPGDGLA
SCHEMBL5325823 0.74 CDK2 (0.40) CSNK2A1ALDH1A1KDM4EHPGDGLA
SCHEMBL973763 0.73 ALDH1A1 (0.43) ALDH1A1KDM4EHPGDGLAMAPK1
SCHEMBL14463868 0.72 CDK2 (0.47) CSNK2A1ALDH1A1KDM4EHPGDGLA
SCHEMBL14423710 0.70 AR (0.40) CSNK2A1KDM4ECDK2HTTKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2007118844-A1 SUBSTITUTED PYRAZOLOPYRIMIDINES, PROCESS FOR THEIR PREPARATION AND THEIR USE FOR CONTROLLING HARMFUL FUNGI AND COMPOSITIONS COMPRISING THEM BASF SE (DE) 2007-10-25 WO disclosed