SCHEMBL532848

SCHEMBL532848

Nc1ccc(-c2nc(S)n[nH]2)cc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 6/20 0.56
RAB9A P51151 6/20 0.56
LMNA P02545 1/20 0.56
SMN1; SMN2 Q16637 5/20 0.47
MAPT P10636 4/20 0.47
GFER P55789 3/20 0.47
ALPL P05186 1/20 0.47
KDM4E B2RXH2 5/20 0.46
ALDH1A1 P00352 5/20 0.46
MEN1 O00255 4/20 0.46
KMT2A Q03164 4/20 0.46
CYP1A2 P05177 2/20 0.46
ATAD2 Q6PL18 1/20 0.41
TP53 P04637 4/20 0.41
HSD17B10 Q99714 3/20 0.41
POLB P06746 2/20 0.41
HPGD P15428 2/20 0.41
GLA P06280 2/20 0.41
RECQL P46063 2/20 0.41
GAA P10253 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20528631 0.80 KDM4E (0.41) NPC1RAB9ASMN1; SMN2ALPLKDM4E
SCHEMBL11509840 0.80 MAPT (0.46) NPC1RAB9ALMNASMN1; SMN2MAPT
SCHEMBL8726601 0.79 ALPL (0.71) NPC1RAB9ALMNASMN1; SMN2MAPT
SCHEMBL688527 0.79 NR1H2 (0.61) NPC1RAB9ALMNASMN1; SMN2MAPT
SCHEMBL1032584 0.78 ROCK2 (0.45) LMNASMN1; SMN2MAPTKDM4EHPGD
SCHEMBL4711144 0.76 NPC1 (0.56) NPC1RAB9ALMNASMN1; SMN2MAPT
SCHEMBL11512806 0.76 KDM4E (0.65) NPC1RAB9ALMNASMN1; SMN2MAPT
SCHEMBL421548 0.76 HTT (0.52) NPC1RAB9ASMN1; SMN2ALPLKDM4E
SCHEMBL11686492 0.73 ENPP2 (0.41) LMNASMN1; SMN2ALPLKDM4EALDH1A1
SCHEMBL11510943 0.72 ALDH1A1 (0.41) NPC1RAB9ALMNASMN1; SMN2MAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 130 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3132932-B1 LITHOGRAPHIC IMAGING AND PRINTING WITH NEGATIVE-WORKING PHOTORESPONSIVE PRINTING MEMBERS PRESSTEK LLC (US) 2020-04-15 EP disclosed
US-20180117900-A1 EDGE TREATMENT FOR DEVELOP-ON-PRESS LITHOGRAPHIC PRINTING MEMBERS PRESSTEK, INC. 2018-05-03 US disclosed
EP-3132932-A2 LITHOGRAPHIC IMAGING AND PRINTING WITH NEGATIVE-WORKING PHOTORESPONSIVE PRINTING MEMBERS Presstek, LLC. (US) 2017-02-22 EP disclosed
US-20170021656-A1 LITHOGRAPHIC IMAGING AND PRINTING WITH NEGATIVE-WORKING PHOTORESPONSIVE PRINTING MEMBERS PRESSTEK, LLC. 2017-01-26 US disclosed
EP-2033051-B1 NEGATIVE-WORKING IMAGEABLE ELEMENTS EASTMAN KODAK CO (US) 2016-11-30 EP disclosed
EP-2217970-B1 IMAGEABLE ELEMENTS WITH COMPONENTS HAVING 1H-TETRAZOLE GROUPS EASTMAN KODAK CO (US) 2015-06-03 EP disclosed
US-8420297-B2 Developers and method of coloring lithographic printing members EASTMAN KODAK COMPANY (US) 2013-04-16 US disclosed
EP-2021873-B1 NEGATIVE-WORKING RADIATION-SENSITIVE COMPOSITIONS AND IMAGEABLE MATERIALS EASTMAN KODAK CO (US) 2013-03-27 EP disclosed
EP-2310909-B1 NEGATIVE-WORKING IMAGEABLE LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHODS OF USE, LITHOGRAPHIC PRINTING PLATE THEREOF EASTMAN KODAK CO (US) 2013-02-13 EP disclosed
US-8354216-B2 Negative-working imaging elements and methods of use EASTMAN KODAK COMPANY (US) 2013-01-15 US disclosed
EP-1622768-A1 ON-PRESS DEVELOPABLE IR SENSITIVE PRINTING PLATES CONTAINING AN ONIUM SALT INITIATOR SYSTEM Kodak Polychrome Graphics LLC (US) 2006-02-08 EP disclosed
WO-2004101280-A1 ON-PRESS DEVELOPABLE IR SENSITIVE PRINTING PLATES CONTAINING AN ONIUM SALT INITIATOR SYSTEM KODAK POLYCHROME GRAPHICS LLC (US) 2004-11-25 WO disclosed
US-20040229165-A1 On-press developable IR sensitive printing plates containing an onium salt initiator system BANK OF AMERICA, N.A., AS AGENT 2004-11-18 US disclosed
US-6096144-A TREATING WITH ACIDIC OR ALKALINE SOLUTION OF CONJUGATED UNSATURATED COMPOUND WITH AT LEAST 5 BONDS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2000-08-01 US disclosed
US-5858571-A TREATING A PULVERIZED HYDROGEN ABSORBING ALLOY WITH A SOLUTION COMPRISING A CONJUGATED UNSATURATED COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-01-12 US disclosed
US-5328803-A Alkali developable solutions with carboxy group binders and monomer with initiators FUJI PHOTO FILM CO., LTD. (JP) 1994-07-12 US disclosed
EP-0172427-B1 PROCESS FOR PRODUCTION OF VINYL CHLORIDE POLYMER Shin-Etsu Chemical Co., Ltd. (JP) 1989-07-05 EP disclosed
US-4758639-A Process for production of vinyl polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-19 US disclosed
US-4757124-A Suspension or emulsion polymerizing vinyl chloride monomer or mixture of vinyl chloride with vinyl monomer copolymerizable therewith in reactor with walls coated with antiscaling compound containing dye or pigments SHIN-ETSU CHEMICAL CO., LTD. (JP) 1988-07-12 US disclosed
EP-0172427-A2 Process for production of vinyl chloride polymer Shin-Etsu Chemical Co., Ltd. (JP) 1986-02-26 EP disclosed