SCHEMBL5334777

SCHEMBL5334777

CCCCCCCCC(C[Si](Cl)(Cl)Cl)[Si](Cl)(Cl)Cl

nearest known ligand 0.38

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
FDPS P14324 4/20 0.38
LMNA P02545 1/20 0.37
DNM1 Q05193 2/20 0.36
LAP3 P28838 1/20 0.35
TSHR P16473 2/20 0.35
THRB P10828 1/20 0.35
OPRM1 P35372 1/20 0.34
SMPD1 P17405 3/20 0.34
GPR84 Q9NQS5 2/20 0.33
ALDH1A1 P00352 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL987703 1.00 FDPS (0.38) FDPSLMNADNM1LAP3TSHR
SCHEMBL14484193 1.00 FDPS (0.38) FDPSLMNADNM1LAP3TSHR
SCHEMBL6841669 0.91 DNM1 (0.33) FDPSDNM1ALDH1A1
SCHEMBL28675045 0.86 LMNA (0.42) FDPSLMNADNM1TSHRTHRB
SCHEMBL1903588 0.86 LMNA (0.42) FDPSLMNADNM1TSHRTHRB
SCHEMBL28418766 0.86 LMNA (0.42) FDPSLMNADNM1TSHRTHRB
SCHEMBL30803745 0.86 LMNA (0.42) FDPSLMNADNM1TSHRTHRB
SCHEMBL3725398 0.86 LMNA (0.42) FDPSLMNADNM1TSHRTHRB
SCHEMBL7895556 0.86 LMNA (0.42) FDPSLMNADNM1TSHRTHRB
SCHEMBL5364584 0.82 LMNA (0.39) FDPSLMNADNM1TSHRTHRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 44 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115003853-B Method for selectively forming metal-containing film 默克专利有限公司 2025-03-07 CN claimed
CN-117343638-A Porous spin-on dielectric coating materials from silicon-containing polymers 上海艾深斯科技有限公司 2024-01-05 CN claimed
US-20230108732-A1 Methods Of Selectively Forming Metal-Containing Films MERCK PATENT GMBH (DE) 2023-04-06 US claimed
EP-4100557-A1 METHODS OF SELECTIVELY FORMING METAL-CONTAINING FILMS Merck Patent GmbH (DE) 2022-12-14 EP claimed
CN-115003853-A Method for selectively forming metal-containing film 默克专利有限公司 2022-09-02 CN claimed
US-9399720-B2 High gain durable anti-reflective coating Enki Technology, Inc. (US) 2016-07-26 US claimed
US-20160032147-A1 HIGH GAIN DURABLE ANTI-REFLECTIVE COATING JPMORGAN CHASE BANK, N.A., AS ADMINISTRATIVE AGENT 2016-02-04 US claimed
US-7235683-B2 Organochlorosilane and dipodal silane compounds GELEST INC. (US) 2007-06-26 US claimed
US-20070060765-A1 ORGANOCHLOROSILANE AND DIPODAL SILANE COMPOUNDS GELEST, INC. (US) 2007-03-15 US claimed
US-20050027138-A1 Processes for manufacturing organochlorosilanes and dipodal silanes and silanes made thereby GELEST INC. 2005-02-03 US claimed
EP-4526052-A1 NON-FLUORINATED ORGANIC COATING MATERIAL FOR A RAZOR BLADE The Gillette Company LLC (US) 2025-03-26 EP disclosed
EP-4526054-A1 NON-FLUORINATED ORGANIC COATING MATERIAL FOR A RAZOR BLADE The Gillette Company LLC (US) 2025-03-26 EP disclosed
EP-4526051-A1 METHOD OF COATING A RAZOR BLADE The Gillette Company LLC (US) 2025-03-26 EP disclosed
EP-4526053-A1 NON-FLUORINATED ORGANIC COATING MATERIAL FOR A RAZOR BLADE The Gillette Company LLC (US) 2025-03-26 EP disclosed
US-12168705-B2 Modified high cis polydiene polymer, related methods and rubber compositions BRIDGESTONE CORPORATION (JP) 2024-12-17 US disclosed
US-7235683-B2 Organochlorosilane and dipodal silane compounds GELEST INC. (US) 2007-06-26 US disclosed
US-20070060765-A1 ORGANOCHLOROSILANE AND DIPODAL SILANE COMPOUNDS GELEST, INC. (US) 2007-03-15 US disclosed
US-20050027138-A1 Processes for manufacturing organochlorosilanes and dipodal silanes and silanes made thereby GELEST INC. 2005-02-03 US disclosed
US-20050027138-A1 Processes for manufacturing organochlorosilanes and dipodal silanes and silanes made thereby GELEST INC. 2005-02-03 US disclosed
US-20040082803-A1 Trichlorosilyl groups containing organochlorosilanes and their preparation methods by the double-silylation of olefins with trichlorosilane KOREA INSTITUTE OF SCIENCE AND TECHNOLOGY 2004-04-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040082803-A1 Trichlorosilyl groups containing organochlorosilanes and their preparation methods by the double-silylation of olefins with trichlorosilane CBR1, OXSR1, HCCS FDPS 3128/4885LMNA 3772/4885DNM1 3474/4885
US-20070060765-A1 ORGANOCHLOROSILANE AND DIPODAL SILANE COMPOUNDS DDT, PIK3C3, PKD1 FDPS 1369/4885LMNA 4806/4885DNM1 1651/4885
US-20050027138-A1 Processes for manufacturing organochlorosilanes and dipodal silanes and silanes made thereby DDT, PIK3C3, PIK3CD FDPS 852/4885LMNA 4831/4885DNM1 2354/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.