SCHEMBL534142

SCHEMBL534142

CO[Si](C)(Cc1ccccc1)OC

nearest known ligand 0.41

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
TSHR P16473 3/20 0.41
ALDH1A1 P00352 1/20 0.41
TP53 P04637 1/20 0.40
LTA4H P09960 1/20 0.40
AOC3 Q16853 2/20 0.38
TAAR1 Q96RJ0 1/20 0.38
CALM1 P0DP23 1/20 0.38
NR1H2 P55055 1/20 0.37
NR1H3 Q13133 1/20 0.37
IDO1 P14902 1/20 0.36
CYP2D6 P10635 1/20 0.35
POLB P06746 1/20 0.35
MAPK1 P28482 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13978505 0.91 LTA4H (0.38) TSHRALDH1A1TP53LTA4HCALM1
SCHEMBL963681 0.87 ESR1 (0.42) ALDH1A1LTA4HAOC3TAAR1IDO1
SCHEMBL109029 0.86 TSHR (0.41) TSHRALDH1A1TP53LTA4HAOC3
SCHEMBL19809228 0.86 TP53 (0.38) TSHRALDH1A1TP53LTA4HCALM1
SCHEMBL19809170 0.82 TP53 (0.35) ALDH1A1TP53LTA4HNR1H2NR1H3
SCHEMBL16062865 0.79 ESR1 (0.37)
SCHEMBL16543227 0.79 TSHR (0.35) TSHRALDH1A1TP53LTA4HAOC3
SCHEMBL5388447 0.78 TSHR (0.42) TSHRALDH1A1TP53LTA4HAOC3
SCHEMBL2804442 0.78 TP53 (0.42) TSHRALDH1A1TP53LTA4HCALM1
SCHEMBL963683 0.78 IDO1 (0.34) ALDH1A1AOC3TAAR1IDO1CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 356 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9181399-B2 Method for producing polysiloxane TOAGOSEI CO., LTD. (JP) 2015-11-10 US claimed
US-20140323677-A1 THERMAL-SHOCK-RESISTANT CURED PRODUCT AND METHOD FOR PRODUCING SAME TOAGOSEI CO., LTD. (JP) 2014-10-30 US claimed
US-20140303392-A1 METHOD FOR PRODUCING POLYSILOXANE TOAGOSEI CO., LTD. (JP) 2014-10-09 US claimed
CN-1965377-B Anti-corrosion additive for electrical cable restoration fluids DOW CORNING INC 2010-12-22 CN claimed
US-7794782-B2 Phosphonate and sulfido silane anti-corrosion additive for electrical cable restoration fluid DOW CORNING CORPORATION (US) 2010-09-14 US claimed
US-20070235700-A1 Phosphonate and Sulfido Silane Anti-Corrosion Additve for Electrical Cable Restoration Fluid DOW CORNING CORPORATION 2007-10-11 US claimed
CN-1965377-A Anti-corrosion additive for electrical cable restoration fluids DOW CORNING (US) 2007-05-16 CN claimed
EP-1769512-A1 ANTI-CORROSION ADDITIVE FOR ELECTRICAL CABLE RESTORATION FLUIDS Dow Corning Corporation (US) 2007-04-04 EP claimed
WO-2005124792-A1 ANTI-CORROSION ADDITIVE FOR ELECTRICAL CABLE RESTORATION FLUIDS DOW CORNING CORPORATION (US) 2005-12-29 WO claimed
WO-2026105442-A1 COATING FILM, ELECTRONIC DEVICE, MOBILE BODY, AND COATING LIQUID ハドラスホールディングス株式会社 2026-05-21 WO disclosed
US-20260118764-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM NISSAN CHEMICAL CORPORATION (JP) 2026-04-30 US disclosed
EP-4715465-A1 MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER Nissan Chemical Corporation (JP) 2026-03-25 EP disclosed
US-12585188-B2 Composition for forming resist underlying film NISSAN CHEMICAL CORPORATION (JP) 2026-03-24 US disclosed
EP-4711423-A1 COATING FILM Hardolass Holdings Co.,Ltd. (JP) 2026-03-18 EP disclosed
CN-1713787-A Organic electroluminescent device, method for producing the same, and electronic apparatus SEIKO EPSON CORP (JP) 2005-12-28 CN disclosed
EP-0274101-B1 RESTORING STRANDED CONDUCTOR ELECTRICAL DISTRIBUTION CABLE DOW CORNING CORPORATION (US) 1993-06-09 EP disclosed
US-4831091-A USING A COORDINATION CATALYST CONTAINING A SILANETRIOL OR -DIOL AS WELL AS AN AROMATIC ESTSER; ODORLESS; STEREOSPECIFIC; PARTICLE SIZES CHISSO CORPORATION (JP) 1989-05-16 US disclosed
US-4766011-A TREATING INTERSTICLES WITH AROMATIC RADICAL CONTAINING SILANE DOW CORNING CORPORATION (US) 1988-08-23 US disclosed
EP-0274101-A2 Restoring stranded conductor electrical distribution cable DOW CORNING CORPORATION (US) 1988-07-13 EP disclosed
US-4469409-A Homogeneous alignment layer for liquid crystal display device HITACHI, LTD. (JP) 1984-09-04 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260118764-A1 COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM SRSF1, MACF1, SRPK1 TSHR 4084/4885ALDH1A1 3642/4885TP53 2101/4885
US-12585188-B2 Composition for forming resist underlying film SRR, SMC1A, ASH2L TSHR 3614/4885ALDH1A1 1320/4885TP53 4706/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.