Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | LTA4H | P09960 | 1/20 | 0.40 |
| ▸ | AOC3 | Q16853 | 2/20 | 0.38 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.38 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.38 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.37 |
| ▸ | NR1H3 | Q13133 | 1/20 | 0.37 |
| ▸ | IDO1 | P14902 | 2/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4811360 | 0.87 | ESR1 (0.42) | LTA4HAOC3TAAR1IDO1 | |
| SCHEMBL534142 | 0.86 | TSHR (0.41) | TSHRALDH1A1TP53LTA4HAOC3 | |
| SCHEMBL5388447 | 0.83 | TSHR (0.42) | TSHRALDH1A1TP53LTA4HAOC3 | |
| SCHEMBL16543227 | 0.83 | TSHR (0.35) | TSHRALDH1A1TP53LTA4HAOC3 | |
| SCHEMBL14665751 | 0.79 | TSHR (0.39) | TSHRALDH1A1TP53LTA4HAOC3 | |
| SCHEMBL16062869 | 0.79 | ESR1 (0.37) | — | |
| SCHEMBL13550868 | 0.79 | TSHR (0.39) | TSHRALDH1A1TP53LTA4HAOC3 | |
| SCHEMBL243501 | 0.79 | TSHR (0.39) | TSHRALDH1A1TP53LTA4HAOC3 | |
| SCHEMBL2804442 | 0.78 | TP53 (0.42) | TSHRALDH1A1TP53LTA4HCALM1 | |
| SCHEMBL104953 | 0.78 | TP53 (0.42) | TSHRALDH1A1TP53LTA4HTAAR1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 463 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119481269-A | Li/CFxElectrolyte for battery and Li/CF containing the samexBattery cell | 惠州亿纬锂能股份有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-112175570-B | Polyurethane adhesive and preparation method thereof | 有行鲨鱼（上海）科技股份有限公司 | 2022-04-29 | — | — | CN | claimed |
| CN-112175571-B | Polyurethane spray adhesive and preparation method thereof | 有行鲨鱼（上海）科技股份有限公司 | 2022-03-11 | — | — | CN | claimed |
| CN-112175571-A | Polyurethane spray adhesive and preparation method thereof | 有行鲨鱼（上海）科技股份有限公司 | 2021-01-05 | — | — | CN | claimed |
| EP-2628744-B1 | Silicon-containing surface modifier, resist underlayer film composition containing this, and patterning process | SHINETSU CHEMICAL CO (JP) | 2016-11-30 | — | — | EP | claimed |
| EP-2628745-B1 | Silicon-containing surface modifier, resist lower layer film-forming composition containing the same, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-03-25 | — | — | EP | claimed |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4715465-A1 | MULTILAYER BODY, METHOD FOR PRODUCING MULTILAYER BODY, AND PHOTOSENSITIVE SURFACE MODIFIER | Nissan Chemical Corporation (JP) | 2026-03-25 | — | — | EP | disclosed |
| US-12585188-B2 | Composition for forming resist underlying film | NISSAN CHEMICAL CORPORATION (JP) | 2026-03-24 | — | — | US | disclosed |
| CN-121586750-A | Composition for forming silicon-containing underlayer film for directional self-assembly | 日产化学株式会社 | 2026-02-27 | — | — | CN | disclosed |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-02-12 | — | — | US | disclosed |
| EP-4692941-A2 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-20060127563-A1 | Patterned substrate, electro-optical device, and method for manufacturing an electro-optical device | SEIKO EPSON CORPORATION (JP) | 2006-06-15 | — | — | US | disclosed |
| CN-1753936-A | Process for producing cation-curable silicon compound | TOAGOSEI CO LTD (JP) | 2006-03-29 | — | — | CN | disclosed |
| US-20060019034-A1 | Process for producing chemical adsorption film and chemical adsorption film | SEIKO EPSON CORPORATION (JP) | 2006-01-26 | — | — | US | disclosed |
| US-20050287392-A1 | Organic electroluminescent device, method for producing the same, and electronic apparatus | SEIKO EPSON CORPORATION (JP) | 2005-12-29 | — | — | US | disclosed |
| EP-1598389-A1 | PROCESS FOR PRODUCING CATION-CURABLE SILICON COMPOUND | TOAGOSEI CO., LTD. (JP) | 2005-11-23 | — | — | EP | disclosed |
| EP-0849270-A2 | Process for the industrial manufacture of a cycloalkylsilane or polyorganosiloxane | DOW CORNING CORPORATION (US) | 1998-06-24 | — | — | EP | disclosed |
| US-5670688-A | Process for the industrial manufacture of a cycloalkylsilane or polyorganosiloxane | DOW CORNING CORPORATION (US) | 1997-09-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260118764-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST UNDERLAYER FILM AND SILICON-CONTAINING RESIST UNDERLAYER FILM | SRSF1, MACF1, SRPK1 | TSHR 4084/4885ALDH1A1 3642/4885TP53 2101/4885 |
| US-12585188-B2 | Composition for forming resist underlying film | SRR, SMC1A, ASH2L | TSHR 3614/4885ALDH1A1 1320/4885TP53 4706/4885 |
| US-20260118767-A1 | REVERSE PATTERNING PROCESS | EFNA1, EPHA4, ETV6 | TSHR 770/4885ALDH1A1 4452/4885TP53 2594/4885 |
| US-20260044081-A1 | COMPOSITION FOR FORMING SILICON-CONTAINING RESIST FILM AND PATTERNING PROCESS | SMC1A, SPOUT1, LBR | TSHR 446/4885ALDH1A1 1558/4885TP53 4717/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.