SCHEMBL5352713

SCHEMBL5352713

C=Cc1ccc(OC(C)(C)c2ccccc2)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.45
ALDH1A1 P00352 8/20 0.45
TSHR P16473 1/20 0.45
ALOX15 P16050 2/20 0.42
TRPA1 O75762 1/20 0.40
PPARA Q07869 4/20 0.38
PPARG P37231 3/20 0.38
LMNA P02545 3/20 0.37
MEN1 O00255 2/20 0.37
KMT2A Q03164 2/20 0.37
NPC1 O15118 1/20 0.37
RAB9A P51151 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
RELA Q04206 1/20 0.37
CHRNA7 P36544 3/20 0.36
CHRNB2 P17787 2/20 0.36
CHRNB4 P30926 2/20 0.36
CHRNA3 P32297 2/20 0.36
CHRNA4 P43681 2/20 0.36
MAPT P10636 3/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9332606 0.84 MAPK1 (0.61) MAPK1ALDH1A1ALOX15TRPA1PPARA
SCHEMBL21136947 0.82 CYP1A2 (0.41) ALDH1A1TSHRPPARARELACHRNA7
SCHEMBL5199756 0.81 ALDH1A1 (0.48) MAPK1ALDH1A1TSHRTRPA1PPARA
Styrene SCHEMBL4582900 0.81 ALDH1A1 (0.54) ALDH1A1TSHRALOX15TRPA1PPARA
SCHEMBL17914418 0.81 CYP26B1 (0.33) ALDH1A1TRPA1PPARAPPARGLMNA
SCHEMBL19286607 0.81 MAPK1 (0.56) MAPK1ALDH1A1TSHRALOX15PPARA
SCHEMBL9331411 0.80 MAPK1 (0.61) MAPK1ALDH1A1TSHRALOX15KMT2A
Styrene SCHEMBL9001187 0.79 MAPK1 (0.68) MAPK1ALDH1A1TSHRALOX15TRPA1
SCHEMBL7209892 0.78 RELA (0.38) ALDH1A1TSHRALOX15PPARAPPARG
SCHEMBL9707201 0.77 MAPK1 (0.52) MAPK1ALDH1A1TSHRALOX15PPARG

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230185192-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-06-15 US disclosed
US-20230185192-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2023-06-15 US disclosed
US-20230161257-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-05-25 US disclosed
US-20230161257-A1 PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2023-05-25 US disclosed
CN-101466804-B sulfonium salt initiator CIBA HOLDING INC. (CH) 2012-02-22 CN disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed