Styrene

Styrene

SCHEMBL4582900

C=Cc1ccc(OC(C)(C)C)cc1.C=Cc1ccccc1

nearest known ligand 0.54

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.54
TSHR P16473 1/20 0.54
TRPA1 O75762 1/20 0.42
PPARA Q07869 4/20 0.39
PPARG P37231 3/20 0.39
RELA Q04206 1/20 0.39
CHRNA7 P36544 4/20 0.38
CHRNB4 P30926 3/20 0.38
CHRNA3 P32297 3/20 0.38
CHRNB2 P17787 2/20 0.38
CHRNA4 P43681 2/20 0.38
KIF11 P52732 1/20 0.38
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
TP53 P04637 2/20 0.36
RAB9A P51151 2/20 0.36
CYP1A2 P05177 2/20 0.36
MAPT P10636 1/20 0.36
NPC1 O15118 1/20 0.36
LMNA P02545 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL131860 0.92 ALDH1A1 (0.50) ALDH1A1TSHRTRPA1PPARAPPARG
SCHEMBL8521425 0.85 RELA (0.42) ALDH1A1TSHRPPARARELACHRNA7
SCHEMBL7541659 0.84 TRPA1 (0.61) ALDH1A1TRPA1PPARAPPARGRELA
SCHEMBL7541661 0.84 TRPA1 (0.61) ALDH1A1TRPA1PPARAPPARGRELA
4-Vinylphenol SCHEMBL3329747 0.83 MEN1 (0.44) ALDH1A1TRPA1CHRNA7CHRNB4CHRNA3
SCHEMBL5381887 0.82 ABL1 (0.38) ALDH1A1TSHRTRPA1PPARAPPARG
SCHEMBL5352713 0.81 MAPK1 (0.45) ALDH1A1TSHRTRPA1PPARAPPARG
SCHEMBL4582901 0.81 MAOB (0.54) ALDH1A1TRPA1PPARAPPARGRELA
Styrene SCHEMBL9614272 0.79 ALDH1A1 (0.64) ALDH1A1TSHRTRPA1MEN1KMT2A
SCHEMBL20390035 0.79 LMNA (0.56) ALDH1A1TRPA1PPARAPPARGRELA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7332254-B2 Positive photosensitive insulating resin composition, cured product thereof, and electronic component JSR CORPORATION (JP) 2008-02-19 US disclosed
US-20070042296-A1 POSITIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION, CURED PRODUCT THEREOF, AND ELECTRONIC COMPONENT JSR CORPORATION (JP) 2007-02-22 US disclosed
EP-0780732-B1 Polymer composition and resist material WAKO PURE CHEM IND LTD (JP) 2003-07-09 EP disclosed
EP-0780732-A2 Polymer composition and resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-06-25 EP disclosed