SCHEMBL5353296

SCHEMBL5353296

OCC(O)CC(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.36

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.36
ALDH1A1 P00352 1/20 0.36
THRB P10828 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8615806 0.98 ALDH1A1 (0.35) LMNAALDH1A1THRB
SCHEMBL8618882 0.98 ALDH1A1 (0.35) LMNAALDH1A1THRB
SCHEMBL8613261 0.98 ALDH1A1 (0.35) LMNAALDH1A1THRB
SCHEMBL8614285 0.98 ALDH1A1 (0.35) LMNAALDH1A1THRB
SCHEMBL8615800 0.98 ALDH1A1 (0.35) LMNAALDH1A1THRB
SCHEMBL8613058 0.98 ALDH1A1 (0.35) LMNAALDH1A1THRB
SCHEMBL8618904 0.98 ALDH1A1 (0.35) LMNAALDH1A1THRB
SCHEMBL197970 0.98 ALDH1A1 (0.35) LMNAALDH1A1THRB
SCHEMBL197103 0.98 ALDH1A1 (0.35) LMNAALDH1A1THRB
SCHEMBL8612590 0.93 LMNA (0.38) LMNAALDH1A1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-120648356-A Scratch repair coating and preparation method thereof 浙江赫克力能源有限公司 2025-09-16 CN disclosed
EP-4509887-A1 REFLECTIVE FILM, MULTILAYER BODY, WINDSHIELD GLASS, AND IMAGE DISPLAY SYSTEM FUJIFILM Corporation (JP) 2025-02-19 EP disclosed
US-20250044481-A1 REFLECTION FILM, LAMINATE, WINDSHIELD GLASS, AND IMAGE DISPLAY SYSTEM FUJIFILM CORPORATION (JP) 2025-02-06 US disclosed
WO-2024203686-A1 LAMINATED GLASS FOR DISPLAYING PROJECTED IMAGE, WINDSHIELD GLASS, AND IMAGE DISPLAY SYSTEM 富士フイルム株式会社 2024-10-03 WO disclosed
CN-112585527-B Liquid crystal panel and image display device 富士胶片株式会社 2024-09-20 CN disclosed
US-20240059860-A1 METHODS AND SYSTEMS FOR DESTRUCTION OF SYNTHETIC PER- AND POLYFLUORO COMPOUNDS CHZ TECHNOLOGIES, LLC 2024-02-22 US disclosed
WO-2023200018-A1 REFLECTIVE FILM, MULTILAYER BODY, WINDSHIELD GLASS, AND IMAGE DISPLAY SYSTEM 富士フイルム株式会社 2023-10-19 WO disclosed
US-20230322742-A1 ORTHOESTER COMPOSITIONS FOR AFFINITY PURIFICATION OF OLIGONUCLEOTIDES AGILENT TECHNOLOGIES, INC. 2023-10-12 US disclosed
EP-3398983-B1 POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS SHINETSU CHEMICAL CO (JP) 2023-09-27 EP disclosed
CN-111830785-B Resin composition, pattern forming method, cured film forming method, interlayer insulating film, surface protecting film, and electronic component 信越化学工业株式会社 2023-08-22 CN disclosed
EP-3734362-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD OF FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT Shin-Etsu Chemical Co., Ltd. (JP) 2020-11-04 EP disclosed
US-20200326624-A1 POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD OF FORMING CURED FILM, INTERLAYER INSULATION FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC COMPONENT SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-10-15 US disclosed
EP-3398983-A1 POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS Shin-Etsu Chemical Co., Ltd. (JP) 2018-11-07 EP disclosed
US-20180275513-A1 POLYMER OF POLYIMIDE PRECURSOR, POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, PATTERNING PROCESS, METHOD FOR FORMING CURED FILM, INTERLAYER INSULATING FILM, SURFACE PROTECTIVE FILM, AND ELECTRONIC PARTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-09-27 US disclosed
US-7169829-B2 Maleimido-bearing compounds resin composition containing the same and cured articles thereof NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2007-01-30 US disclosed
US-20050009947-A1 Maleimido-bearing compounds resin composition containing the same and cured articles thereof NIPPON KAYAKU KABUSHIKI KAISHA (JP) 2005-01-13 US disclosed
EP-1460092-A1 MALEIMIDO-BEARING COMPOUNDS, RESIN COMPOSITIONS CONTAINING THE SAME AND CURED ARTICLES THEREOF Nippon Kayaku Kabushiki Kaisha (JP) 2004-09-22 EP disclosed
EP-0837085-A1 POLYCARBONATE-BASE POLYMER, PRODUCTION PROCESS, RESIN COATING FLUID PREPARED THEREFROM, AND ELECTROPHOTOGRAPHIC PHOTORECEPTOR PREPARED THEREFROM IDEMITSU KOSAN COMPANY LIMITED (JP) 1998-04-22 EP disclosed
US-5254660-A Polyurethanes, fluoropolymers BAYER AKTIENGESELLSCHAFT (DE) 1993-10-19 US disclosed
EP-0540976-A1 Use of polyisocyanate solutions for the impregnation of mineral substrates BAYER AG (DE) 1993-05-12 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20230322742-A1 ORTHOESTER COMPOSITIONS FOR AFFINITY PURIFICATION OF OLIGONUCLEOTIDES RNGTT, OSBPL8, DCLRE1B LMNA 3111/4885ALDH1A1 4172/4885THRB 688/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.