SCHEMBL5367202

SCHEMBL5367202

O=S(=O)(O)c1ccc2cccc3c2c1CC3

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP11B1 P15538 1/20 0.46
CYP11B2 P19099 1/20 0.46
HSD17B10 Q99714 3/20 0.40
LMNA P02545 2/20 0.40
TTR P02766 2/20 0.39
FABP4 P15090 1/20 0.39
CCNA2 P20248 1/20 0.39
CDK2 P24941 1/20 0.39
MAPK14 Q16539 1/20 0.39
CYP3A4 P08684 2/20 0.38
TSHR P16473 2/20 0.38
NR4A1 P22736 1/20 0.38
KDM4E B2RXH2 7/20 0.37
ALDH1A1 P00352 5/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
MAPK1 P28482 2/20 0.37
USP2 O75604 1/20 0.37
MAPT P10636 1/20 0.37
RECQL P46063 1/20 0.37
KMT2A Q03164 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11117006 0.78 TTR (0.41) HSD17B10LMNATTRFABP4CCNA2
SCHEMBL1729565 0.74 ALDH1A1 (0.58) CYP11B1CYP11B2HSD17B10LMNATTR
SCHEMBL5379940 0.73 CYP11B1 (0.51) CYP11B1CYP11B2HSD17B10LMNACDK2
SCHEMBL11422536 0.72 ALDH1A1 (0.56) CYP11B1CYP11B2HSD17B10LMNATTR
Hydrochloric Acid SCHEMBL27532840 0.72 CYP11B1 (0.50) CYP11B1CYP11B2HSD17B10LMNACDK2
SCHEMBL5372899 0.71 KDM4E (0.48) CYP11B1CYP11B2HSD17B10LMNACYP3A4
SCHEMBL154911 0.71 TSHR (0.70) CYP11B1CYP11B2HSD17B10LMNACYP3A4
SCHEMBL29706425 0.71 TSHR (0.70) CYP11B1CYP11B2HSD17B10LMNACYP3A4
SCHEMBL18725829 0.70 CYP11B1 (0.45) CYP11B1CYP11B2HSD17B10LMNACYP3A4
SCHEMBL5376045 0.70 KDM4E (0.58) CYP11B1CYP11B2HSD17B10LMNACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070248911-A1 Pattern forming method and bilayer film IWASAWA HARUO 2007-10-25 US disclosed
US-7244549-B2 Pattern forming method and bilayer film JSR CORPORATION (JP) 2007-07-17 US disclosed
US-20030073040-A1 Pattern forming method and bilayer film JSR CORPORATION (JP) 2003-04-17 US disclosed
US-4171459-A Manufacture of α-naphthol BASF AKTIENGESELLSCHAFT (DE) 1979-10-16 US disclosed
US-4143050-A MANUFACTURE OF 3-HALOSULFONYLTHIOPHENE-CARBOXYLIC ACID COMPOUNDS BASF AKTIENGESELLSCHAFT (DE) 1979-03-06 US disclosed
US-4117019-A MANUFACTURE OF O-BENZYLTOLUENES BASF AKTIENGESELLSCHAFT (DE) 1978-09-26 US disclosed