SCHEMBL5372899

SCHEMBL5372899

O=C(O)c1ccc2cccc3c2c1CC3

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 8/20 0.48
KMT2A Q03164 5/20 0.48
MAPT P10636 2/20 0.48
USP2 O75604 1/20 0.48
MAPK1 P28482 1/20 0.48
RECQL P46063 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
CYP11B1 P15538 1/20 0.47
CYP11B2 P19099 1/20 0.47
ALDH1A1 P00352 6/20 0.46
HSD17B10 Q99714 5/20 0.46
MEN1 O00255 3/20 0.46
TSHR P16473 2/20 0.46
RXFP1 Q9HBX9 1/20 0.46
HPGD P15428 4/20 0.44
LMNA P02545 2/20 0.41
WDR5 P61964 1/20 0.41
LDHA P00338 1/20 0.40
CYP3A4 P08684 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5376045 0.85 KDM4E (0.58) KDM4EKMT2AMAPTUSP2MAPK1
SCHEMBL21847561 0.82 KMT2A (0.58) KDM4EKMT2AMAPTUSP2MAPK1
SCHEMBL18538369 0.81 KDM4E (0.45) KDM4EKMT2AMAPTUSP2MAPK1
SCHEMBL18499906 0.81 KDM4E (0.45) KDM4EKMT2AMAPTUSP2MAPK1
SCHEMBL15330692 0.79 ALDH1A1 (0.50) KDM4EMAPTALDH1A1HSD17B10TSHR
SCHEMBL29950657 0.79 ALDH1A1 (0.50) KDM4EMAPTALDH1A1HSD17B10TSHR
SCHEMBL7824033 0.79 FABP4 (0.43) KDM4EKMT2AMAPTUSP2MAPK1
SCHEMBL26184886 0.77 ALDH1A1 (0.46) KDM4EKMT2AMAPTUSP2MAPK1
SCHEMBL29769278 0.77 CYP1A2 (0.63) KDM4EMAPTALDH1A1HSD17B10TSHR
SCHEMBL21688 0.77 CYP1A2 (0.63) KDM4EMAPTALDH1A1HSD17B10TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 42 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11208509-B2 Polymer compound for conductive polymer and method for producing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-12-28 US disclosed
US-10851188-B2 Polymer compound for conductive polymer and method for producing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-12-01 US disclosed
US-20200291145-A1 POLYMER COMPOUND FOR CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-09-17 US disclosed
US-20200247926-A1 POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-06 US disclosed
EP-3067897-B1 CONDUCTIVE MATERIAL AND SUBSTRATE SHINETSU CHEMICAL CO (JP) 2020-05-27 EP disclosed
EP-3115413-B1 CONDUCTIVE POLYMER COMPOSITION, COATED ARTICLE, AND PATTERNING PROCESS SHINETSU CHEMICAL CO (JP) 2020-05-06 EP disclosed
US-10559397-B2 Conductive polymer composite and substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-02-11 US disclosed
US-10515735-B2 2019-12-24 US disclosed
US-10363555-B2 Polymer compound for conductive polymer and method for producing the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2019-07-30 US disclosed
EP-3073494-B1 CONDUCTIVE MATERIAL AND SUBSTRATE SHINETSU CHEMICAL CO (JP) 2019-06-26 EP disclosed
US-9601229-B2 Conductive polymer composite comprising a sulfo group-containing dopant polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-21 US disclosed
US-9595362-B2 Conductive polymer composition comprising a sulfo group-containing dopant polymer SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-14 US disclosed
US-9587137-B2 Conductive polymer composite comprising a sulfo group-containing dopant polymer and substrate SHI-ETSU CHEMICAL CO., LTD. (JP) 2017-03-07 US disclosed
US-20170062089-A1 CONDUCTIVE POLYMER COMPOSITE AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-02 US disclosed
US-20170058059-A1 POLYMER COMPOUND FOR A CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-02 US disclosed
US-20170058066-A1 POLYMER COMPOUND FOR A CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-02 US disclosed
US-9568821-B2 Patterning process SAMSUNG ELECTRONICS CO., LTD. (KR) 2017-02-14 US disclosed
US-20070248911-A1 Pattern forming method and bilayer film IWASAWA HARUO 2007-10-25 US disclosed
US-7244549-B2 Pattern forming method and bilayer film JSR CORPORATION (JP) 2007-07-17 US disclosed
US-20030073040-A1 Pattern forming method and bilayer film JSR CORPORATION (JP) 2003-04-17 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200247926-A1 POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND HCN4, HCN2, HCN3 KDM4E 1649/4885KMT2A 971/4885MAPT 1482/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.