Water

Water

SCHEMBL5367241

O.[MgH2].[Zr]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL10535137 1.00
Water SCHEMBL21112981 0.87
Water SCHEMBL22716174 0.87
Water SCHEMBL20556992 0.87
Water SCHEMBL22716443 0.87
Water SCHEMBL1711800 0.82
Water SCHEMBL345104 0.82
Water SCHEMBL10986986 0.82
Water SCHEMBL11655347 0.82
Water SCHEMBL8035384 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-105418096-A Self-adaptive zirconium oxide tundish nozzle ZHEJIANG IRON LION HIGH TEMPERATURE MAT CO LTD 2016-03-23 CN claimed
CN-105272224-A Preparation method of Al2O3 doped Mg-PSZ (magnesia partially stabilized zirconia) ceramic UNIV SHANGHAI 2016-01-27 CN claimed
CN-104860686-A Method for preparing magnesia-stabilized zirconia crucible through casting molding UNIV SHANGHAI 2015-08-26 CN claimed
CN-104844201-A Method for preparing zirconium oxide/zirconium tungstate composite material by utilizing crystal form stabilized zirconium oxide as raw material HARBIN INST OF TECHNOLOGY 2015-08-19 CN claimed
CN-103771853-A Preparation method for sizing nozzle used for continuous casting WUXI SHENJIA HYDRAULIC TECHNOLOGY CO LTD 2014-05-07 CN claimed
CN-103771871-A Metering nozzle for continuous casting WUXI SHENJIA HYDRAULIC TECHNOLOGY CO LTD 2014-05-07 CN claimed
CN-102766837-B Novel thermal barrier coating TAICANG LINJIANG FARM COOPERATIVE 2014-02-19 CN claimed
WO-2012170337-A1 POLYCRYSTALLINE TRANSLUCENT ALUMINA DOPED WITH MAGNESIUM OXIDE/ZIRCONIUM FOR HIGH INTENSITY DISCHARGE LAMPS GENERAL ELECTRIC COMPANY (US) 2012-12-13 WO claimed
US-20120306365-A1 POLYCRYSTALLINE TRANSLUSCENT ALUMINA FOR HIGH INTENSITY DISCHARGE LAMPS GENERAL ELECTRIC COMPANY 2012-12-06 US claimed
CN-102766837-A Novel thermal barrier coating KUNSHAN QIAORUI METAL CO LTD 2012-11-07 CN claimed
CN-1064260-A With the fine and close self-reinforced silicon nitride ceramic that does not have the preparation of pressure or low-pressure gas sintering process DOW CHEMICAL CO (US) 1992-09-09 CN claimed
CN-104600273-B A kind of phosphorous anode material for lithium-ion batteries and preparation method thereof 国联汽车动力电池研究院有限责任公司 2018-10-26 CN disclosed
CN-105593705-B Light colored scratch resistant articles with multilayer optical films 康宁股份有限公司 2018-05-29 CN disclosed
CN-106727477-A The novel form of Diclofenac 伊休蒂卡有限公司 2017-05-31 CN disclosed
CN-106727424-A The novel form of Diclofenac 伊休蒂卡有限公司 2017-05-31 CN disclosed
CN-101412537-A Preparation of nano zircite powder GUANGYUAN XIE (CN) 2009-04-22 CN disclosed
US-20070031321-A1 Apparatus and method for purification of corrosive gas streams ENTEGRIS, INC. 2007-02-08 US disclosed
CN-1283590-C Refractory raw material prepared by carbon conbined reducing desilicon process RUITAI HIGH TEMP MATERIAL SCIE (CN) 2006-11-08 CN disclosed
CN-1809412-A Apparatus and method for purification of corrosive gas streams ENTEGRIS INC (US) 2006-07-26 CN disclosed
CN-1648104-A Clean producing technology for preparing refractory raw material using volatile aids reduction RUITAI HIGH TEMPERATURE MATERI (CN) 2005-08-03 CN disclosed